Optimization of a High-Performance Chemically Amplified Positive Resist for Electron-Beam Lithography
1996 ◽
Vol 35
(Part 1, No. 12B)
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pp. 6506-6510
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Keyword(s):
1993 ◽
Vol 11
(6)
◽
pp. 2807
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1994 ◽
Vol 12
(1)
◽
pp. 37
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1983 ◽
Vol 41
◽
pp. 96-99
1998 ◽
Vol 41-42
◽
pp. 183-186
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2011 ◽
Vol 497
◽
pp. 127-132
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2003 ◽
Vol 21
(6)
◽
pp. 3149
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2016 ◽
Vol 55
(5)
◽
pp. 056503
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