Highly Reliable, Backside Emissivity Independent Cobalt Silicide Process Using a Susceptor-Based Low Pressure Rapid Thermal Processing System
1998 ◽
Vol 37
(Part 2, No. 10B)
◽
pp. L1221-L1223
Keyword(s):
1999 ◽
Vol 38
(Part 2, No. 3B)
◽
pp. L304-L307
◽
Keyword(s):
2000 ◽
Vol 147
(12)
◽
pp. 4660
◽
Keyword(s):
2003 ◽
Vol 125
(3)
◽
pp. 504-511
◽
2001 ◽
Vol 14
(1)
◽
pp. 1-10
◽