Low-Temperature Plasma-Enahanced Chemical Vapor Deposition of Crystal Silicon Film from Dichlorosilane

Japanese Journal of Applied Physics ◽

10.1143/jjap.40.44 ◽

2001 ◽

Vol 40 (Part 1, No. 1) ◽

pp. 44-48 ◽

Author(s):

Haiping Liu ◽

Sughoan Jung ◽

Yukihiro Fujimura ◽

Chisato Fukai ◽

Hajime Shirai ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Silicon Film ◽

Chemical Vapor ◽

Low Temperature Plasma ◽

Crystal Silicon ◽

Temperature Plasma

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LOW TEMPERATURE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF CARBON FILMS ON DIFFERENT SUBSTRATES

High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes ◽

10.1615/hightempmatproc.v10.i3.90 ◽

2006 ◽

Vol 10 (3) ◽

pp. 457-466

Author(s):

A. Ya. Vinogradov ◽

A. N. Andronov ◽

A. B Ustinov ◽

K. E. Orlov ◽

A. S. Smirnov

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Low Temperature Plasma ◽

Temperature Plasma

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Study of boron nitride gate insulators grown by low temperature plasma enhanced chemical vapor deposition on InP

Applied Surface Science ◽

10.1016/0169-4332(89)90426-1 ◽

1989 ◽

Vol 39 (1-4) ◽

pp. 135-140 ◽

Author(s):

A. Bath ◽

P.J. van der Put ◽

J. Schoonman ◽

B. Lepley

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Boron Nitride ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Temperature Plasma ◽

Temperature Plasma ◽

Gate Insulators

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Film Characteristics of Low-Temperature Plasma-Enhanced Chemical Vapor Deposition Silicon Dioxide Using Tetraisocyanatesilane and Oxygen

Japanese Journal of Applied Physics ◽

10.1143/jjap.37.6562 ◽

1998 ◽

Vol 37 (Part 1, No. 12A) ◽

pp. 6562-6568 ◽

Author(s):

Irman Idris ◽

Osamu Sugiura

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Temperature Plasma ◽

Temperature Plasma ◽

Film Characteristics

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Electron microscopy studies of crystallites in carbon nanopillars grown by low-temperature plasma-enhanced chemical-vapor deposition

Journal of Surface Investigation X-ray Synchrotron and Neutron Techniques ◽

10.1134/s102745101701027x ◽

2017 ◽

Vol 11 (1) ◽

pp. 226-233 ◽

Author(s):

Ya. S. Grishina ◽

N. I. Borgardt ◽

R. L. Volkov ◽

D. G. Gromov ◽

S. V. Dubkov

Keyword(s):

Electron Microscopy ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Temperature Plasma ◽

Temperature Plasma

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High deposition rates for microcrystalline silicon with low temperature plasma enhanced chemical vapor deposition processes

Journal of Non-Crystalline Solids ◽

10.1016/s0022-3093(98)00343-3 ◽

1998 ◽

Vol 227-230 ◽

pp. 861-865 ◽

Author(s):

P Hapke ◽

F Finger

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Temperature Plasma ◽

Microcrystalline Silicon ◽

Temperature Plasma ◽

Deposition Rates ◽

Deposition Processes

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Radio frequency magnetron sputtering of Au and low temperature plasma enhanced chemical vapor deposition of silicon nitride for ring ultramicroelectrodes fabrication

Journal of Electroanalytical Chemistry ◽

10.1016/j.jelechem.2006.07.030 ◽

2006 ◽

Vol 596 (2) ◽

pp. 124-130 ◽

Author(s):

Mingzhi Zhu ◽

Zhuangde Jiang ◽

Weixuan Jing ◽

Biao Yang

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Low Temperature ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Temperature Plasma ◽

Radio Frequency Magnetron Sputtering ◽

Temperature Plasma

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Properties of SiO N thin film deposited by low temperature plasma enhanced chemical vapor deposition using TEOS–NH3–O2–N2 gas mixtures

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2005.01.119 ◽

2005 ◽

Vol 200 (1-4) ◽

pp. 680-685 ◽

Author(s):

J.H. Lee ◽

C.H. Jeong ◽

J.T. Lim ◽

N.G. Jo ◽

S.J. Kyung ◽

...

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Gas Mixtures ◽

Low Temperature Plasma ◽

Temperature Plasma

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Low‐temperature plasma enhanced chemical vapor deposition of SiO2

Applied Physics Letters ◽

10.1063/1.112475 ◽

1994 ◽

Vol 65 (25) ◽

pp. 3185-3187 ◽

Author(s):

Shashank C. Deshmukh ◽

Eray S. Aydil

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Temperature Plasma ◽

Temperature Plasma

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Low Temperature Plasma Enhanced Chemical Vapor Deposition-Synthesized Electrochromic MoO$_{x}$C$_{y}$ Thin Films for Flexible Electrochromic Devices

Japanese Journal of Applied Physics ◽

10.1143/jjap.51.01ac03 ◽

2012 ◽

Vol 51 (1) ◽

pp. 01AC03 ◽

Author(s):

Yung-Sen Lin ◽

Jhen-Yi Lai

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Temperature Plasma ◽

Electrochromic Devices ◽

Temperature Plasma

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Effects of oxygen addition on electrochromic properties in low temperature plasma-enhanced chemical vapor deposition-synthesized MoO C thin films for flexible electrochromic devices

Thin Solid Films ◽

10.1016/j.tsf.2011.02.011 ◽

2011 ◽

Vol 519 (11) ◽

pp. 3875-3882 ◽

Author(s):

Yung-Sen Lin ◽

Jhen-Yi Lai ◽

Tsung-Hsien Tsai ◽

Pei-Ying Chuang ◽

Yen-Cheng Chen

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Temperature Plasma ◽

Electrochromic Devices ◽

Temperature Plasma ◽

Electrochromic Properties ◽

Oxygen Addition

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