High-Rate Deposition of Amorphous Silicon Films by Atmospheric-Pressure Plasma Chemical Vapor Deposition
2000 ◽
Vol 71
(8)
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pp. 3173-3177
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2006 ◽
Vol 45
(4B)
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pp. 3592-3597
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2013 ◽
Vol 31
(6)
◽
pp. 061508
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2005 ◽
Vol 351
(8-9)
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pp. 741-747
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1999 ◽
Vol 65
(11)
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pp. 1600-1604
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2004 ◽
Vol 70
(8)
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pp. 1075-1079