Defect-free growth of epitaxial silicon at low temperatures (500–800 °C) by atmospheric pressure plasma chemical vapor deposition

Applied Physics A ◽

10.1007/s00339-004-3198-5 ◽

2005 ◽

Vol 81 (6) ◽

pp. 1139-1144 ◽

Author(s):

K. Yasutake ◽

H. Kakiuchi ◽

H. Ohmi ◽

K. Yoshii ◽

Y. Mori

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Low Temperatures ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Epitaxial Silicon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

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Photoluminescence Study of Defect-Free Epitaxial Silicon Films Grown at Low Temperatures by Atmospheric Pressure Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.46.2510 ◽

2007 ◽

Vol 46 (4B) ◽

pp. 2510-2515 ◽

Author(s):

Kiyoshi Yasutake ◽

Naotaka Tawara ◽

Hiromasa Ohmi ◽

Yoshikazu Terai ◽

Hiroaki Kakiuchi ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Low Temperatures ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Epitaxial Silicon ◽

Plasma Chemical ◽

Photoluminescence Study ◽

Plasma Chemical Vapor Deposition

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Characterization of Epitaxial Silicon Films Grown by Atmospheric Pressure Plasma Chemical Vapor Deposition at Low Temperatures (450-600℃)

10.7567/ssdm.2006.i-8-4 ◽

2006 ◽

Author(s):

Naotaka Tawara ◽

Hiromasa Ohmi ◽

Yoshikazu Terai ◽

Hiroaki Kakiuchi ◽

Heiji Watanabe ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Low Temperatures ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Epitaxial Silicon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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High-rate growth of epitaxial silicon at low temperatures (530–690 °C) by atmospheric pressure plasma chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(03)01148-9 ◽

2003 ◽

Vol 444 (1-2) ◽

pp. 138-145 ◽

Author(s):

Y. Mori ◽

K. Yoshii ◽

K. Yasutake ◽

H. Kakiuchi ◽

H. Ohmi ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Low Temperatures ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

High Rate ◽

Epitaxial Silicon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Effect of hydrogen on the structure of high-rate deposited SiC on Si by atmospheric pressure plasma chemical vapor deposition using high-power-density condition

Thin Solid Films ◽

10.1016/j.tsf.2005.08.338 ◽

2006 ◽

Vol 496 (2) ◽

pp. 259-265 ◽

Author(s):

H. Kakiuchi ◽

H. Ohmi ◽

M. Aketa ◽

K. Yasutake ◽

K. Yoshii ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

High Rate ◽

High Power Density ◽

Density Condition ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Characterization of Epitaxial Si Films Grown by Atmospheric Pressure Plasma Chemical Vapor Deposition Using Cylindrical Rotary Electrode

Japanese Journal of Applied Physics ◽

10.1143/jjap.45.3592 ◽

2006 ◽

Vol 45 (4B) ◽

pp. 3592-3597 ◽

Author(s):

Kiyoshi Yasutake ◽

Hiromasa Ohmi ◽

Hiroaki Kakiuchi ◽

Takuya Wakamiya ◽

Heiji Watanabe

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Pressure Plasma ◽

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Abrasion resistance of silica-based coatings prepared by atmospheric pressure plasma chemical vapor deposition for protection of polymeric surfaces

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.4818150 ◽

2013 ◽

Vol 31 (6) ◽

pp. 061508 ◽

Author(s):

Mayui Noborisaka ◽

Takanori Mori ◽

Ryohei Horikoshi ◽

Akira Shirakura ◽

Ayako Hashimoto ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Abrasion Resistance ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Polymeric Surfaces ◽

Plasma Chemical Vapor Deposition ◽

Pressure Plasma

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Silicon Dioxide Deposited Using Atmospheric Pressure Plasma Chemical Vapor Deposition for Improved Adhesion and Water Intrusion Resistance for Lightweight Manufacturing

Surfaces and Interfaces ◽

10.1016/j.surfin.2021.100989 ◽

2021 ◽

Vol 23 ◽

pp. 100989

Author(s):

Zachary Jeckell ◽

Dhruval Patel ◽

Andrew Herschberg ◽

Tag Choi ◽

David Barlaz ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Water Intrusion ◽

Pressure Plasma

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High-Rate Deposition of Amorphous Silicon Films by Atmospheric-Pressure Plasma Chemical Vapor Deposition

Crystal Growth Technology ◽

10.1002/0470871687.ch29 ◽

2004 ◽

pp. 645-652 ◽

Author(s):

Yuzo Mori ◽

Hiroaki Kakiuchi ◽

Kumayasu Yoshii ◽

Kiyoshi Yasutake

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

High Rate ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Pressure Plasma

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Atmospheric pressure plasma chemical vapor deposition system for high-rate deposition of functional materials

Review of Scientific Instruments ◽

10.1063/1.1305510 ◽

2000 ◽

Vol 71 (8) ◽

pp. 3173-3177 ◽

Author(s):

Y. Mori ◽

K. Yoshii ◽

H. Kakiuchi ◽

K. Yasutake

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Functional Materials ◽

High Rate ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Pressure Plasma

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Characterization of intrinsic amorphous silicon layers for solar cells prepared at extremely high rates by atmospheric pressure plasma chemical vapor deposition

Journal of Non-Crystalline Solids ◽

10.1016/j.jnoncrysol.2004.08.271 ◽

2005 ◽

Vol 351 (8-9) ◽

pp. 741-747 ◽

Author(s):

H. Kakiuchi ◽

M. Matsumoto ◽

Y. Ebata ◽

H. Ohmi ◽

K. Yasutake ◽

...

Keyword(s):

Solar Cells ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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