Searching for Novel Ru-Based Thin Film Metallic Glass by Combinatorial Arc Plasma Deposition

2007 ◽  
Vol 46 (4A) ◽  
pp. 1590-1595 ◽  
Author(s):  
Junpei Sakurai ◽  
Seiichi Hata ◽  
Ryusuke Yamauchi ◽  
Akira Shimokohbe
2007 ◽  
Vol 254 (3) ◽  
pp. 720-724 ◽  
Author(s):  
Junpei Sakurai ◽  
Seiichi Hata ◽  
Ryusuke Yamauchi ◽  
Akira Shimokohbe

2005 ◽  
Vol 894 ◽  
Author(s):  
Ryusuke Yamauchi ◽  
Seiichi Hata ◽  
Junpei Sakurai ◽  
Akira Shimokohbe

AbstractIn order to optimize low electrical resistivity compositions of Pd-based thin film metallic glass (TFMG), Combinatorial arc plasma deposition (CAPD) was employed. A Pd-based continuous compositionally-graded thin film was deposited using CAPD in the experiments. To deposit the composition-grade of the Pd-rich thin film, the number of shots and the plasma strength were controlled. The deposited thin film was separated into 1,089 samples for measurements. The thickness, composition, phase and relative resistivity of these samples were measured respectively. And three amorphous CAPD samples exhibiting low relative resistivity were selected. To determine whether these were TFMG compositions, their compositions were reproduced on sputter-deposited samples and their Tg and Tx were measured. It was found that the sample of Pd81Cu5Si14 at.% showed the lowest absolute resistivity (60 μΩ·cm) and the largest temperature range of supercooled liquid region (SCLR) i.e., 60 K among all samples. The resistivity was 19% lower than conventional Pd-based TFMG and SCLR was two and half times as large. The tensile strength was higher than the conventional TFMG and the Young's modulus was lower than the conventional one.


2007 ◽  
Vol 1024 ◽  
Author(s):  
Junpei Sakurai ◽  
Seiichi Hata ◽  
Ryusuke Yamauchi ◽  
Hiroyuki Tachikawa ◽  
Akira Shimokohbe

AbstractThis paper presents the properties of Pt-based thin film amorphous alloys developed for a glass lens mold. To search for the amorphous alloys, Pt-Zr-Ni and Pt-Hf-Ni thin film libraries were fabricated using combinatorial arc plasma deposition (CAPD). The composition ranges of the amorphous region in each library were 50 to 60 at.% Pt, 0 to 20 at.% Ni, and balance being Zr or Hf. To evaluate the thermal and mechanical properties of these amorphous alloys, Pt51Zr39Ni10 and Pt52Hf36Ni12 samples, as typical amorphous samples, were prepared by sputtering. The Pt51Zr39Ni10 sample showed a crystallization temperature, Tx, of 939 K and a fracture stress, σf, of 1.44 GPa. The Pt52Hf36Ni12 sample showed a Tx of 978 K and a σf of 0.3 GPa. The Pt51Zr39Ni10 and Pt52Hf36Ni12 samples did not achieve the target Tx (973K) and σf (1.0 GPa). In order to achieve the target properties, Zr was displaced with Hf to increase the Tx of Pt-Zr-Ni and four Pt51HfxZr37-xNi12 samples were prepared. The Pt51Hf20Zr17Ni12 sample had a Tx of 992 K and a σf of 0.87 GPa, and almost achieved the target properties. The machinability of the Pt51Hf20Zr17Ni12 sample was also evaluated. Though this sample could be cut using a diamond tool, it did not show sufficient machinability. In order to improve the accuracy of the glass mold shape, the machinability of the Pt-based thin film amorphous alloys require further modification.


2005 ◽  
Vol 894 ◽  
Author(s):  
Seiichi Hata ◽  
Ryusuke Yamauchi ◽  
Junpei Sakurai ◽  
Akira Shimokohbe

AbstractCombinatorial arc plasma deposition (CAPD) method was used to search for new compositions of thin film amorphous alloys. A cathodic arc plasma gun (APG) was adopted as the deposition source for CAPD. The CAPD setup has three APGs radiating out from the center of a substrate. The APGs shoot pulse-like plasma shots one by one at a specific time interval. The plasma from each APG cathode is guided onto a specific area on a substrate by a magnetic field. Each such area overlaps the adjacent ones. Thus, a compositionally-graded thin film is deposited in the overlap area because of mixing of each deposited thin film from each APG that has a thickness grade. The deposited thin film is separated into 1,089 samples (the size of each is 1×1 mm2) using a grid on the substrate. The samples together are referred to as the thin film library. To demonstrate the capability of CAPD, two thin film libraries were deposited in this study. One is a thin film library of a PdCuSi alloy system, and the other is a MoZrPd system. The compositions and crystallinity of the samples were evaluated on the substrate using EDS and IP-XRD respectively. Analysis of the samples showed a graded composition, and some of the samples were shown to be amorphous in both libraries.


2021 ◽  
pp. 161437
Author(s):  
J. Antonowicz ◽  
P. Zalden ◽  
K. Sokolowski-Tinten ◽  
K. Georgarakis ◽  
R. Minikayev ◽  
...  

Author(s):  
Niklas Bönninghoff ◽  
Wahyu Diyatmika ◽  
Jinn P. Chu ◽  
Stanislav Mráz ◽  
Jochen M. Schneider ◽  
...  

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