Effects of Substrate Bias Voltage on Structural, Mechanical and Tribological Properties of Diamond-Like Carbon Films Prepared by Plasma-Enhanced Chemical Vapor Deposition Using Methane and Argon Gases

2008 ◽  
Vol 47 (1) ◽  
pp. 231-236 ◽  
Author(s):  
Hideki Nakazawa ◽  
Shigeki Katoh ◽  
Yuhki Asai ◽  
Masao Mashita
2012 ◽  
Vol 182-183 ◽  
pp. 232-236 ◽  
Author(s):  
Jin Feng Cui ◽  
Li Qiang ◽  
Bin Zhang ◽  
Xiao Ling ◽  
Jun Yan Zhang

Ti containing hydrogenated diamond like carbon films (Ti-DLC) was deposited on Si substrates at room temperature by magnetron sputtering Ti-twin target in methane and argon mixture atmosphere via changing the substrate bias voltage. The Ti atomic concentration in the film is less than 0.57% and exists mainly in the form of metallic titanium rather than TiC, confirmed by XPS analysis. The internal compressive stress of the film decreases monotonically with the substrate bias voltage increase. However, the hardness values of the film keep at level (12 GPa) without almost any obvious change with the increase of the substrate bias voltage. Furthermore, Ti-containing DLC film prepared at -1600 V substrate bias voltage shows an extremely low wear rate (~10-9mm3/Nm) and low friction coefficient (0.09).


2010 ◽  
Vol 42 (12-13) ◽  
pp. 1702-1705 ◽  
Author(s):  
R. Maheswaran ◽  
R. Sivaraman ◽  
O. Mahapatra ◽  
P. C. Rao ◽  
C. Gopalakrishnan ◽  
...  

2013 ◽  
Vol 52 (11R) ◽  
pp. 110123 ◽  
Author(s):  
Meng Yang ◽  
Susumu Takabayashi ◽  
Shuichi Ogawa ◽  
Hiroyuki Hayashi ◽  
Radek Ješko ◽  
...  

2012 ◽  
Vol 523 ◽  
pp. 25-28 ◽  
Author(s):  
Meng Yang ◽  
Shuichi Ogawa ◽  
Susumu Takabayashi ◽  
Taiichi Otsuji ◽  
Yuji Takakuwa

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