Comparison of Multilayer Dielectric Thin Films for Future Metal–Insulator–Metal Capacitors: Al$_{2}$O$_{3}$/HfO$_{2}$/Al$_{2}$O$_{3}$ versus SiO$_{2}$/HfO$_{2}$/SiO$_{2}$
2011 ◽
Vol 50
(10)
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pp. 10PB06
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2011 ◽
Vol 50
(10S)
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pp. 10PB06
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2011 ◽
Vol 158
(1)
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pp. G1
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2007 ◽
Vol 46
(10B)
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pp. 6984-6986
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