WITHDRAWN: Tailored cerium-aluminate high-k dielectric thin films for metal–insulator–metal device applications

2009 ◽  
Author(s):  
Rakesh Sohal ◽  
Grzegorz Lupina ◽  
Peter Zaumseil ◽  
Thomas Schroeder
Keyword(s):  
Thin Films ◽  
Metal Insulator ◽  
Dielectric Thin Films ◽  
High K ◽  
Metal Insulator Metal ◽  
Device Applications ◽  
High K Dielectric

Comparison of Multilayer Dielectric Thin Films for Future Metal–Insulator–Metal Capacitors: Al2O3/HfO2/Al2O3versus SiO2/HfO2/SiO2

2011 ◽  
Vol 50 (10S) ◽  
pp. 10PB06 ◽  
Author(s):  
Sang-Uk Park ◽  
Hyuk-Min Kwon ◽  
In-Shik Han ◽  
Yi-Jung Jung ◽  
Ho-Young Kwak ◽  
...  
Keyword(s):  
Thin Films ◽  
Metal Insulator ◽  
Dielectric Thin Films ◽  
Metal Insulator Metal ◽  
Multilayer Dielectric

Nonvolatile Memory Characteristics Induced in High-k Dielectric Thin Films through Electron Irradiation

2011 ◽  
Vol 59 (2(2)) ◽  
pp. 726-729 ◽  
Author(s):  
Chan-Rock Park ◽  
Hong-Kyoung Lee ◽  
Jin-Ha Hwang ◽  
Young-Hwan Hahn ◽  
Byeong-Cheol Lee ◽  
...  
Keyword(s):  
Thin Films ◽  
Electron Irradiation ◽  
Nonvolatile Memory ◽  
Dielectric Thin Films ◽  
High K ◽  
High K Dielectric ◽  
Memory Characteristics

Atomic layer-by-layer MOCVD of high-k dielectric thin films with in-situ monitoring by spectroscopic ellipsometry

2002 ◽  
Author(s):  
Yoshishige Tsuchiya ◽  
Masato Endoh ◽  
Masatoshi Kurosawa ◽  
Raymond T. Tung ◽  
Takeo Hattori ◽  
...  
Keyword(s):  
Thin Films ◽  
Spectroscopic Ellipsometry ◽  
Atomic Layer ◽  
In Situ Monitoring ◽  
Layer By Layer ◽  
Dielectric Thin Films ◽  
High K ◽  
High K Dielectric
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