Erratum: “Comparison of Multilayer Dielectric Thin Films for Future Metal–Insulator–Metal Capacitors: Al2O3/HfO2/Al2O3versus SiO2/HfO2/SiO2”

Japanese Journal of Applied Physics ◽

10.7567/jjap.50.129202 ◽

2011 ◽

Vol 50 (12R) ◽

pp. 129202

Author(s):

Sang-Uk Park ◽

Hyuk-Min Kwon ◽

In-Shik Han ◽

Yi-Jung Jung ◽

Ho-Young Kwak ◽

...

Keyword(s):

Metal Insulator ◽

Dielectric Thin Films ◽

Metal Insulator Metal ◽

Multilayer Dielectric

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Comparison of Multilayer Dielectric Thin Films for Future Metal–Insulator–Metal Capacitors: Al2O3/HfO2/Al2O3versus SiO2/HfO2/SiO2

Japanese Journal of Applied Physics ◽

10.7567/jjap.50.10pb06 ◽

2011 ◽

Vol 50 (10S) ◽

pp. 10PB06 ◽

Author(s):

Sang-Uk Park ◽

Hyuk-Min Kwon ◽

In-Shik Han ◽

Yi-Jung Jung ◽

Ho-Young Kwak ◽

...

Keyword(s):

Metal Insulator ◽

Dielectric Thin Films ◽

Metal Insulator Metal ◽

Multilayer Dielectric

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Comparison of Multilayer Dielectric Thin Films for Future Metal–Insulator–Metal Capacitors: Al$_{2}$O$_{3}$/HfO$_{2}$/Al$_{2}$O$_{3}$ versus SiO$_{2}$/HfO$_{2}$/SiO$_{2}$

Japanese Journal of Applied Physics ◽

10.1143/jjap.50.10pb06 ◽

2011 ◽

Vol 50 (10) ◽

pp. 10PB06 ◽

Author(s):

Sang-Uk Park ◽

Hyuk-Min Kwon ◽

In-Shik Han ◽

Yi-Jung Jung ◽

Ho-Young Kwak ◽

...

Keyword(s):

Metal Insulator ◽

Dielectric Thin Films ◽

Metal Insulator Metal ◽

Multilayer Dielectric

Download Full-text

Erratum: “Comparison of Multilayer Dielectric Thin Films for Future Metal–Insulator–Metal Capacitors: Al$_{2}$O$_{3}$/HfO$_{2}$/Al$_{2}$O$_{3}$ versus SiO$_{2}$/HfO$_{2}$/SiO$_{2}$”

Japanese Journal of Applied Physics ◽

10.1143/jjap.50.129202 ◽

2011 ◽

Vol 50 ◽

pp. 129202

Author(s):

Sang-Uk Park ◽

Hyuk-Min Kwon ◽

In-Shik Han ◽

Yi-Jung Jung ◽

Ho-Young Kwak ◽

...

Keyword(s):

Metal Insulator ◽

Dielectric Thin Films ◽

Metal Insulator Metal ◽

Multilayer Dielectric

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NiCr Bottom Electrodes for Ta 2 O 5 High Dielectric Thin Films in Metal-Insulator-Metal Capacitors

Integrated Ferroelectrics ◽

10.1080/713718288 ◽

2002 ◽

Vol 47 (1) ◽

pp. 41-48 ◽

Author(s):

Eung-Min Lee ◽

Soon-Gil Yoon

Keyword(s):

Metal Insulator ◽

Dielectric Thin Films ◽

Metal Insulator Metal ◽

High Dielectric

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WITHDRAWN: Tailored cerium-aluminate high-k dielectric thin films for metal–insulator–metal device applications

Thin Solid Films ◽

10.1016/j.tsf.2009.12.008 ◽

2009 ◽

Author(s):

Rakesh Sohal ◽

Grzegorz Lupina ◽

Peter Zaumseil ◽

Thomas Schroeder

Keyword(s):

Metal Insulator ◽

Dielectric Thin Films ◽

High K ◽

Metal Insulator Metal ◽

Device Applications ◽

High K Dielectric

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Electrical Characteristics of HfO2-Al2O3 Dielectric Thin Films Grown by Atomic-Layer-Deposition in Metal-Insulator-Metal Capacitor Configuration

ECS Meeting Abstracts ◽

10.1149/ma2007-01/17/816 ◽

2007 ◽

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Electrical Characteristics ◽

Metal Insulator ◽

Dielectric Thin Films ◽

Layer Deposition ◽

Metal Insulator Metal

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Atomic-Layer-Deposited Dielectric Thin Films on a Cu Clad Laminate Substrate for Embedded Metal–Insulator–Metal Capacitor Applications in Printed Circuit Boards

Journal of The Electrochemical Society ◽

10.1149/1.3514601 ◽

2011 ◽

Vol 158 (1) ◽

pp. G1 ◽

Author(s):

Tae Joo Park ◽

Jeong Hwan Kim ◽

Jae Hyuck Jang ◽

Cheol Seong Hwang ◽

Hyung-Dong Kang ◽

...

Keyword(s):

Printed Circuit Boards ◽

Atomic Layer ◽

Circuit Boards ◽

Metal Insulator ◽

Dielectric Thin Films ◽

Printed Circuit ◽

Metal Insulator Metal

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Electrical Characterization Techniques of Dielectric Thin Films Using Metal–Insulator–Metal Structures

Japanese Journal of Applied Physics ◽

10.1143/jjap.46.6984 ◽

2007 ◽

Vol 46 (10B) ◽

pp. 6984-6986 ◽

Author(s):

Yukio Fukuda ◽

Yohei Otani ◽

Hiroshi Toyota ◽

Toshiro Ono

Keyword(s):

Electrical Characterization ◽

Metal Insulator ◽

Dielectric Thin Films ◽

Metal Structures ◽

Characterization Techniques ◽

Metal Insulator Metal

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Atomic Vapor Depositions of Ti–Ta–O thin films for Metal–Insulator–Metal applications

Thin Solid Films ◽

10.1016/j.tsf.2011.01.239 ◽

2011 ◽

Vol 519 (11) ◽

pp. 3831-3834 ◽

Author(s):

M. Lukosius ◽

C. Baristiran Kaynak ◽

Ch. Wenger ◽

G. Ruhl ◽

S. Rushworth ◽

...

Keyword(s):

Atomic Vapor ◽

Metal Insulator ◽

Metal Insulator Metal

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Enhancement on crystallinity property of low annealed PbTiO3 thin films for metal-insulator-metal capacitor

10.1063/1.5036872 ◽

2018 ◽

Author(s):

Z. Nurbaya ◽

M. H. Wahid ◽

M. D. Rozana ◽

S. A. H. Alrokayan ◽

H. A. Khan ◽

...

Keyword(s):

Metal Insulator ◽

Metal Insulator Metal

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