Electrochemical Impedance Spectroscopy of Copper Deposition on Silicon from Dilute Hydrofluoric Acid Solutions

1998 ◽  
Vol 145 (1) ◽  
pp. 352-357 ◽  
Author(s):  
X. Cheng ◽  
G. Li ◽  
E. A. Kneer ◽  
B. Vermeire ◽  
H. G. Parks ◽  
...  
Keyword(s):  
Electrochemical Impedance Spectroscopy ◽  
Impedance Spectroscopy ◽  
Hydrofluoric Acid ◽  
Electrochemical Impedance ◽  
Copper Deposition ◽  
Acid Solutions

The Effect of Corrosion Inhibitor in Hydrofluoric Acid Medium

2013 ◽  
Vol 750-752 ◽  
pp. 2258-2262 ◽  
Author(s):  
Wei Ming Wu ◽  
Ding Li ◽  
Hai Yan Du
Keyword(s):  
Weight Loss ◽  
Corrosion Resistance ◽  
Electrochemical Impedance Spectroscopy ◽  
Impedance Spectroscopy ◽  
Mild Steel ◽  
Hydrofluoric Acid ◽  
Corrosion Inhibitors ◽  
Electrochemical Impedance ◽  
Potassium Thiocyanate ◽  
Inhibition Effect

The experiments were done to find some good corrosion inhibitors for mild steel in 5% HF solution by the method of weight loss and electrochemistry including polarization curves and electrochemical impedance spectroscopy (EIS). Results show that the thiourea, potassium thiocyanate, and hexamethylenetetramine have good inhibition effect for mild steel in 5% HF solution, especially potassium thiocyanate and thiourea. Their corrosion resistance was greatly enhanced in the presence of tested inhibitor. Thiourea is an anodic type inhibitor and its inhibition efficiencies up to 99.88% can be obtained. Equivalent circuit of the investigated system was suggested.

Sign in / Sign up

Export Citation Format

Share Document