Influence of Temperature on the Saturation of the Forward Voltage Drift in SiC Pin Diodes

2019 ◽  
Vol 11 (5) ◽  
pp. 239-245
Author(s):  
Joshua D. Caldwell ◽  
Robert Stahlbush ◽  
Orest Glembocki ◽  
Karl Hobart
Author(s):  
S.I. Maximenko ◽  
Stanislav Soloviev ◽  
A.E. Grekov ◽  
A. Bolotnikov ◽  
Ying Gao ◽  
...  

2005 ◽  
Vol 483-485 ◽  
pp. 989-992 ◽  
Author(s):  
S.I. Maximenko ◽  
Stanislav I. Soloviev ◽  
A.E. Grekov ◽  
A.V. Bolotnikov ◽  
Ying Gao ◽  
...  

The degradation of diffused SiC PIN diodes during forward-biased operation was studied by first fabricating PIN diodes by diffusion of aluminum or boron into 4H-SiC substrates with n-type 10-15 µm thick epilayers doped by nitrogen up to 5x1015cm-3. The formed diodes were subjected to degradation testing under an applied current density of 200A/cm2 at room temperature. The majority of the Al diffused diodes demonstrated a voltage drift, ΔVf, of more than 2 V, while B-doped diodes showed no significant change in forward voltage. The EBIC mode of SEM was employed to monitor nucleation and expansion of stacking faults.


2009 ◽  
Vol 615-617 ◽  
pp. 703-706 ◽  
Author(s):  
Nicolas Dheilly ◽  
Dominique Planson ◽  
Pierre Brosselard ◽  
Jawad ul Hassan ◽  
Pascal Bevilacqua ◽  
...  

This paper reports on the influence of temperature on the electrical carrier lifetime of a 3.3 kV 4H-SiC PiN diode processed with a new generation of SiC material. The Open Circuit Voltage Decay (OCVD) is used to evaluate ambipolar lifetime evolution versus temperature. The paper presents a description of the setup, electrical measurements and extraction fittings. The ambipolar lifetime is found to rise from 600 ns at 30 °C to 3.5 μs at 150 °C.


2007 ◽  
Vol 37 (5) ◽  
pp. 699-705 ◽  
Author(s):  
Joshua D. Caldwell ◽  
Orest J. Glembocki ◽  
Robert E. Stahlbush ◽  
Karl D. Hobart

2004 ◽  
Vol 457-460 ◽  
pp. 1105-1108 ◽  
Author(s):  
Mrinal K. Das ◽  
Joseph J. Sumakeris ◽  
Michael J. Paisley ◽  
Adrian R. Powell

2009 ◽  
Vol 24 (9) ◽  
pp. 095004 ◽  
Author(s):  
P Brosselard ◽  
A Pérez-Tomás ◽  
J Hassan ◽  
N Camara ◽  
X Jordà ◽  
...  

2013 ◽  
Vol 740-742 ◽  
pp. 899-902 ◽  
Author(s):  
Birgit Kallinger ◽  
Patrick Berwian ◽  
Jochen Friedrich ◽  
Christian Hecht ◽  
Dethard Peters ◽  
...  

4H-SiC PiN diodes for 6.5 kV were manufactured on both 4° and 8° off-cut substrates and subjected to an electrical stress test on wafer level and subsequent analysis of structural defects present in the active area of the diodes. For 8° off-cut diodes, the electrical characteristics with respect to leakage current and forward voltage drift are worse than the electrical characteristics of 4° off-cut diodes. Furthermore, a large number of stacking faults was found in 8° off-cut diodes, but little evidence for bipolar degradation was found in 4° off-cut diodes. Therefore, bipolar degradation was significantly reduced by avoiding BPDs in the active area of PiN diodes, i.e. by the use of 4° off-cut substrates. Furthermore, a strong correlation was found between the electrical screening test on wafer level and critical defects.


Author(s):  
T. Geipel ◽  
W. Mader ◽  
P. Pirouz

Temperature affects both elastic and inelastic scattering of electrons in a crystal. The Debye-Waller factor, B, describes the influence of temperature on the elastic scattering of electrons, whereas the imaginary part of the (complex) atomic form factor, fc = fr + ifi, describes the influence of temperature on the inelastic scattering of electrons (i.e. absorption). In HRTEM simulations, two possible ways to include absorption are: (i) an approximate method in which absorption is described by a phenomenological constant, μ, i.e. fi; - μfr, with the real part of the atomic form factor, fr, obtained from Hartree-Fock calculations, (ii) a more accurate method in which the absorptive components, fi of the atomic form factor are explicitly calculated. In this contribution, the inclusion of both the Debye-Waller factor and absorption on HRTEM images of a (Oll)-oriented GaAs crystal are presented (using the EMS software.Fig. 1 shows the the amplitudes and phases of the dominant 111 beams as a function of the specimen thickness, t, for the cases when μ = 0 (i.e. no absorption, solid line) and μ = 0.1 (with absorption, dashed line).


2010 ◽  
Vol 25 (1) ◽  
pp. 93-105 ◽  
Author(s):  
Daniel Żarski ◽  
Dariusz Kucharczyk ◽  
Wojciech Sasinowski ◽  
Katarzyna Targońska ◽  
Andrzej Mamcarz

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