Kinetics of Deposition of Cu Thin Films in Supercritical Carbon Dioxide Solutions from a F-Free Copper(II) β-Diketone Complex

2009 ◽  
Vol 156 (6) ◽  
pp. H443 ◽  
Author(s):  
Masahiro Matsubara ◽  
Michiru Hirose ◽  
Kakeru Tamai ◽  
Yukihiro Shimogaki ◽  
Eiichi Kondoh
2004 ◽  
Vol 812 ◽  
Author(s):  
Yinfeng Zong ◽  
James J. Watkins

AbstractThe kinetics of copper deposition by the hydrogen-assisted reduction of bis(2,2,7- trimethyloctane-3,5-dionato)copper in supercritical carbon dioxide was studied as a function of temperature and precursor concentration. The growth rate was found to be as high as 31.5 nm/min. Experiments between 220 °C and 270 °C indicated an apparent activation energy of 51.9 kJ/mol. The deposition kinetics were zero order with respect to precursor at 250 °C and 134 bar and precursor concentrations between 0.016 and 0.38 wt.% in CO2. Zero order kinetics over this large concentration interval likely contributes to the exceptional step coverage obtained from Cu depositions from supercritical fluids.


2002 ◽  
Vol 60 (4) ◽  
pp. 559-565 ◽  
Author(s):  
T Koga ◽  
Y.-S Seo ◽  
X Hu ◽  
K Shin ◽  
Y Zhang ◽  
...  

2016 ◽  
Vol 117 ◽  
pp. 289-296 ◽  
Author(s):  
Marie Sajfrtová ◽  
Marie Cerhová ◽  
Vladislav Dřínek ◽  
Stanislav Daniš ◽  
Lenka Matějová

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