Study on Thermal Stability of Plasma-PH[sub 3] Passivated HfAlO/In[sub 0.53]Ga[sub 0.47]As Gate Stack for Advanced Metal-Oxide-Semiconductor Field Effect Transistor
2010 ◽
Vol 13
(10)
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pp. H336
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2010 ◽
Vol 49
(12)
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pp. 124202
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2017 ◽
Vol 70
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pp. 246-253
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Keyword(s):
2021 ◽
Vol 134
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pp. 106046
Keyword(s):
2020 ◽
Vol 21
(3)
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pp. 339-347
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1997 ◽
Vol 9
(8)
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pp. 1143-1145
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