The Effect of Thermal Treatment Induced Performance Improvement for Charge Trapping Memory with Al2O3/(HfO2)0.9(Al2O3)0.1/Al2O3 Multilayer Structure

2018 ◽  
Vol 7 (12) ◽  
pp. Q229-Q234 ◽  
Author(s):  
Zhaozhao Hou ◽  
Zhenhua Wu ◽  
Huaxiang Yin
2006 ◽  
Vol 45 (4B) ◽  
pp. 3179-3184
Author(s):  
Lei Sun ◽  
Liyang Pan ◽  
Huiqing Pang ◽  
Ying Zeng ◽  
Zhaojian Zhang ◽  
...  

2015 ◽  
Vol 26 (45) ◽  
pp. 455704 ◽  
Author(s):  
Jianling Meng ◽  
Rong Yang ◽  
Jing Zhao ◽  
Congli He ◽  
Guole Wang ◽  
...  

1988 ◽  
Vol 100 ◽  
Author(s):  
K. Maex ◽  
R. F. De Keersmaecker ◽  
M. Van rossum ◽  
W. F. Van Der Weg

ABSTRACTThe amorphous phaseformation in Ti-Si bilayers upon ion mixing at elevated temperatures and in Ti-Si multilayers upon thermal treatment was studied. In the case of ion mixing with 5×1015 cm−2 Xe atoms at temperatures around 240°C a 100nm thick amorphous Ti-Si alloy is formed with a very homogeneous Ti:Si=3 :4 composition. Thermal treatment of the Ti-Si multilayer structure at similar temperatures also yields amorphous silicide layers. The results are interpreted according to the evolution in a planar binary diffusion couple, where the Si and Ti concentrations in the reacted layer are dictated by thermodynamic and kinetic arguments.


2019 ◽  
Vol 62 (12) ◽  
Author(s):  
Kai Xi ◽  
Jinshun Bi ◽  
Sandip Majumdar ◽  
Bo Li ◽  
Jing Liu ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document