Residual Stress Mechanisms in Aluminum Oxide Films Grown by MOCVD
1988 ◽
Vol 49
(C4)
◽
pp. C4-409-C4-412
◽
C. BOURREAU
◽
Y. CATHERINE
Jun Chen
◽
Peng Wang
◽
Can Liu
◽
Guoqiang Yu
◽
Tao Wang
◽
...
2015 ◽
Vol 586
◽
pp. 8-12
◽
Xiaoxuan Jia
◽
Huiyuan Sun
◽
Lihu Liu
◽
Xue Hou
◽
Huiyuan Liu
1997 ◽
Vol 90
(1-2)
◽
pp. 102-106
◽
C.H. Lin
◽
H.L. Wang
◽
M.H. Hon
2000 ◽
Vol 368
(1)
◽
pp. 74-79
◽
A. Ortiz
◽
J.C. Alonso
◽
V. Pankov
◽
A. Huanosta
◽
E. Andrade
2014 ◽
Vol 111
◽
pp. 185-189
◽
Qin Xu
◽
Wen-Jiang Ye
◽
Shun-Zhen Feng
◽
Hui-Yuan Sun
2010 ◽
Vol 396
(1)
◽
pp. 65-70
◽
H.X. Zhang
◽
D. Fruchart
◽
E.K. Hlil
◽
L. Ortega
◽
Z.K. Li
◽
...
2014 ◽
Vol 552
◽
pp. 124-135
◽
Oili M.E. Ylivaara
◽
Xuwen Liu
◽
Lauri Kilpi
◽
Jussi Lyytinen
◽
Dieter Schneider
◽
...
Anna L. D'Entremont
◽
Roderick E. Fuentes
◽
Luke C. Olson
◽
Robert L. Sindelar
2000 ◽
Vol 464
(2-3)
◽
pp. 108-116
◽
D.R. Jennison
◽
A. Bogicevic