Ultrathin Aluminum Oxide Films Induced by Rapid Thermal Annealing for Effective Silicon Surface Passivation

Author(s):  
Jun Chen ◽  
Peng Wang ◽  
Can Liu ◽  
Guoqiang Yu ◽  
Tao Wang ◽  
...  
2016 ◽  
Vol 92 ◽  
pp. 317-325 ◽  
Author(s):  
Lachlan E. Black ◽  
Thomas Allen ◽  
Keith R. McIntosh ◽  
Andres Cuévas

2017 ◽  
Vol 122 (3) ◽  
pp. 035302 ◽  
Author(s):  
Bart Macco ◽  
Jimmy Melskens ◽  
Nikolas J. Podraza ◽  
Karsten Arts ◽  
Christopher Pugh ◽  
...  

RSC Advances ◽  
2016 ◽  
Vol 6 (100) ◽  
pp. 97720-97727 ◽  
Author(s):  
Rajbir Singh ◽  
Vandana Vandana ◽  
Jagannath Panigrahi ◽  
P. K. Singh

Plasma assisted ALD deposited hafnium oxide films are studied for silicon surface passivation. SRV < 40 cm s−1 are realized under optimised conditions.


2020 ◽  
Vol 10 (6) ◽  
pp. 1614-1623
Author(s):  
Shweta Tomer ◽  
Meenakshi Devi ◽  
Abhishek Kumar ◽  
Subha Laxmi ◽  
C. M. S. Rauthan ◽  
...  

2018 ◽  
Vol 12 (7) ◽  
pp. 1800156 ◽  
Author(s):  
Chang‐Yeh Lee ◽  
Shaozhou Wang ◽  
Xin Cui ◽  
Tian Zhang ◽  
Rong Deng ◽  
...  

2017 ◽  
Vol 26 (9) ◽  
pp. 098103 ◽  
Author(s):  
Cai-Xia Hou ◽  
Xin-He Zheng ◽  
Rui Jia ◽  
Ke Tao ◽  
San-Jie Liu ◽  
...  

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