Hybrid Orientation Substrate Fabrication Using Electron Beam Induced Orientation Selective Epitaxial Growth of CeO2(100) and (110) Areas on Si(100) Substrates

1993 ◽  
Vol 32 (Part 1, No. 6A) ◽  
pp. 2582-2586 ◽  
Author(s):  
Makoto Ishida ◽  
Takashi Tomita ◽  
Masahiko Fujita ◽  
Tetsuro Nakamura

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