(Invited) Technology Breakthrough by Ferroelectric HfO2 for Low Power Logic and Memory Applications

Author(s):  
Daniele Caimi ◽  
Marilyne Sousa ◽  
Siegfried Karg ◽  
Cezar Zota

1980 ◽  
Author(s):  
G. Nuzillat ◽  
G. Bert ◽  
F. Damay-Kavala ◽  
C. Arnodo
Keyword(s):  

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