In Situ Observations of Molecular CO2 Interaction on SnS2 Thin Film for Gas-Phase Photocatalytic CO2 Reduction Activity

ABSTRACTThe polymerization of ethylene on surfaces sequentially dosed with TiC14 and trimethylaluminum was studied by Fourier transform infrared spectroscopy. The polymer film was observed in situ as a function of time and under the influence of 254-nm cw radiation. The rate of polymerization and the saturation thickness of the polyethylene are strongly dependent on the order of dosing and the partial pressures of the reactants that form the catalyst. UV enhancement of polymerization was demonstrated to occur through two separate photochemical channels: gas-phase photolysis of the reactants and solid-phase chemical transformation of a noncatalytic thin film.

Download Full-text

2D-2D MnO2/g-C3N4 heterojunction photocatalyst: In-situ synthesis and enhanced CO2 reduction activity

Carbon ◽

10.1016/j.carbon.2017.05.024 ◽

2017 ◽

Vol 120 ◽

pp. 23-31 ◽

Cited By ~ 106

Author(s):

Min Wang ◽

Meng Shen ◽

Lingxia Zhang ◽

Jianjian Tian ◽

Xixiong Jin ◽

...

Keyword(s):

Co2 Reduction ◽

In Situ Synthesis ◽

Reduction Activity

Download Full-text

In situ observations of gas phase dynamics during graphene growth using solid-state carbon sources

Physical Chemistry Chemical Physics ◽

10.1039/c3cp50959a ◽

2013 ◽

Vol 15 (25) ◽

pp. 10446 ◽

Cited By ~ 15

Author(s):

Jinsung Kwak ◽

Tae-Yang Kwon ◽

Jae Hwan Chu ◽

Jae-Kyung Choi ◽

Mi-Sun Lee ◽

...

Keyword(s):

Solid State ◽

Gas Phase ◽

Carbon Sources ◽

Graphene Growth ◽

Phase Dynamics ◽

In Situ Observations

Download Full-text

In-situ observations of stress-induced thin film failures

Thin Solid Films ◽

10.1016/j.tsf.2009.09.004 ◽

2010 ◽

Vol 518 (8) ◽

pp. 2037-2044

Author(s):

Z.B. Zhao ◽

J. Hershberger ◽

J.C. Bilello

Keyword(s):

Thin Film ◽

In Situ Observations

Download Full-text

In situ observations of electromigration induced void behavior

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100137598 ◽

1995 ◽

Vol 53 ◽

pp. 244-245

Author(s):

T. Marieb ◽

J. C. Bravman ◽

P. Flinn ◽

D. Gardner ◽

M. Madden

Keyword(s):

Electron Microscopy ◽

Void Nucleation ◽

Plan View ◽

Transmission Electron ◽

Nucleation Sites ◽

Microelectronics Industry ◽

In Situ Observations ◽

Backscatter Electron Detector ◽

Voltage Scanning

Electromigration and stress voiding have been active areas of research in the microelectronics industry for many years. While accelerated testing of these phenomena has been performed for the last 25 years[1-2], only recently has the introduction of high voltage scanning electron microscopy (HVSEM) made possible in situ testing of realistic, passivated, full thickness samples at high resolution.With a combination of in situ HVSEM and post-testing transmission electron microscopy (TEM) , electromigration void nucleation sites in both normal polycrystalline and near-bamboo pure Al were investigated. The effect of the microstructure of the lines on the void motion was also studied.The HVSEM used was a slightly modified JEOL 1200 EX II scanning TEM with a backscatter electron detector placed above the sample[3]. To observe electromigration in situ the sample was heated and the line had current supplied to it to accelerate the voiding process. After testing lines were prepared for TEM by employing the plan-view wedge technique [6].

Download Full-text

The use of transmission and analytical electron microscopy in studying reactions and phase transformations in thin film

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100150046 ◽

1993 ◽

Vol 51 ◽

pp. 842-843

Author(s):

K. Barmak

Keyword(s):

Thin Film ◽

Thin Films ◽

Phase Transformations ◽

Analytical Electron Microscopy ◽

Ex Situ ◽

Multilayer Thin Films ◽

Absolute Concentration ◽

Analytical Electron ◽

Deposition Step

Generally, processing of thin films involves several annealing steps in addition to the deposition step. During the annealing steps, diffusion, transformations and reactions take place. In this paper, examples of the use of TEM and AEM for ex situ and in situ studies of reactions and phase transformations in thin films will be presented.The ex situ studies were carried out on Nb/Al multilayer thin films annealed to different stages of reaction. Figure 1 shows a multilayer with dNb = 383 and dAl = 117 nm annealed at 750°C for 4 hours. As can be seen in the micrograph, there are four phases, Nb/Nb3-xAl/Nb2-xAl/NbAl3, present in the film at this stage of the reaction. The composition of each of the four regions marked 1-4 was obtained by EDX analysis. The absolute concentration in each region could not be determined due to the lack of thickness and geometry parameters that were required to make the necessary absorption and fluorescence corrections.

Download Full-text