Nanosynthesis of Tunable Composite Materials by Room-Temperature Pulsed Focused Electron Beam Induced Chemical Vapour Deposition

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2011.5067 ◽

2011 ◽

Vol 11 (9) ◽

pp. 7982-7987 ◽

Author(s):

M. S. Gabureac ◽

L. Bernau ◽

I. Utke

Keyword(s):

Electron Beam ◽

Composite Materials ◽

Chemical Vapour Deposition ◽

Room Temperature ◽

Vapour Deposition ◽

Chemical Vapour

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Room-Temperature Ferromagnetism of Ga 1− x Mn x N Grown by Low-Pressure Metalorganic Chemical Vapour Deposition

Chinese Physics Letters ◽

10.1088/0256-307x/23/5/061 ◽

2006 ◽

Vol 23 (5) ◽

pp. 1286-1288 ◽

Author(s):

Chen Zhi-Tao ◽

Su Yue-Yong ◽

Yang Zhi-Jian ◽

Zhang Yan ◽

Zhang Bin ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Room Temperature ◽

Vapour Deposition ◽

Room Temperature Ferromagnetism ◽

Chemical Vapour ◽

Low Pressure ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Microfabrication of diamond films by localized electron beam chemical vapour deposition

Semiconductor Science and Technology ◽

10.1088/0268-1242/17/10/311 ◽

2002 ◽

Vol 17 (10) ◽

pp. 1096-1100 ◽

Author(s):

Shuji Kiyohara ◽

Hideaki Takamatsu ◽

Katsumi Mori

Keyword(s):

Electron Beam ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Diamond Films ◽

Chemical Vapour

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Room temperature formation of rhodium nanoparticles on TiO2[110] via MetalOrganic Chemical-Vapour Deposition (MOCVD) of [Rh(CO)2Cl]2

Chemical Communications ◽

10.1039/b003782f ◽

2000 ◽

pp. 1677-1678 ◽

Author(s):

Mark A. Newton ◽

John Evans ◽

Roger A. Bennett ◽

Rupert D. Smith ◽

Michael Bowker

Keyword(s):

Chemical Vapour Deposition ◽

Room Temperature ◽

Vapour Deposition ◽

Chemical Vapour ◽

Rhodium Nanoparticles ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Room-Temperature Ferromagnetic ZnMnO Thin Films Synthesized by Plasma Enhanced Chemical Vapour Deposition Method

Chinese Physics Letters ◽

10.1088/0256-307x/24/7/082 ◽

2007 ◽

Vol 24 (7) ◽

pp. 2085-2087 ◽

Author(s):

Lin Ying-Bin ◽

Lu Zhi-Hai ◽

Zou Wen-Qin ◽

Lu Zhong-Lin ◽

Xu Jian-Ping ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Room Temperature ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Method ◽

Chemical Vapour Deposition Method

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Long wavelength room temperature laser operation of a strained InGaAs/GaAs quantum well structure monolithically grown by metalorganic chemical vapour deposition on a low energy-plasma enhanced chemical vapour deposition graded misoriented Ge/Si virtual substrate

Optical Materials ◽

10.1016/j.optmat.2004.08.022 ◽

2005 ◽

Vol 27 (5) ◽

pp. 846-850 ◽

Author(s):

Y. Chriqui ◽

G. Saint-Girons ◽

G. Isella ◽

H. von Kaenel ◽

S. Bouchoule ◽

...

Keyword(s):

Quantum Well ◽

Chemical Vapour Deposition ◽

Room Temperature ◽

Vapour Deposition ◽

Chemical Vapour ◽

Laser Operation ◽

Long Wavelength ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Coordination and organometallic precursors of group 10 and 11: Focused electron beam induced deposition of metals and insight gained from chemical vapour deposition, atomic layer deposition, and fundamental surface and gas phase studies

Coordination Chemistry Reviews ◽

10.1016/j.ccr.2021.213851 ◽

2022 ◽

pp. 213851

Author(s):

I. Utke ◽

P. Swiderek ◽

K. Höflich ◽

K. Madajska ◽

J. Jurczyk ◽

...

Keyword(s):

Electron Beam ◽

Atomic Layer Deposition ◽

Gas Phase ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Atomic Layer ◽

Layer Deposition ◽

Electron Beam Induced Deposition ◽

Organometallic Precursors

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Electron beam induced damage in N-rich SiNx films deposited by plasma enhanced chemical vapour deposition

Thin Solid Films ◽

10.1016/s0040-6090(96)09357-1 ◽

1997 ◽

Vol 296 (1-2) ◽

pp. 28-31 ◽

Author(s):

Ch.B. Lioutas ◽

N. Vouroutzis ◽

E.C. Paloura ◽

Y. Kuo

Keyword(s):

Electron Beam ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour

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Room temperature CW operation of GaInAsP/InP double-heterostructure diode lasers emitting at 1.23 μm grown by low-pressure metalorganic chemical vapour deposition

Electronics Letters ◽

10.1049/el:19810420 ◽

1981 ◽

Vol 17 (17) ◽

pp. 597 ◽

Author(s):

M. Razeghi ◽

J.P. Hirtz ◽

P. Hirtz ◽

J.P. Larivain ◽

R. Bondeau ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Room Temperature ◽

Vapour Deposition ◽

Diode Lasers ◽

Chemical Vapour ◽

Low Pressure ◽

Double Heterostructure ◽

Cw Operation ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Erratum to “Room temperature annealing of 5.48 MeV He induced defect in p+ n and n+ p grown by metal–organic chemical vapour deposition” [Solid-State Electronics Volume 44(4) 639–648]

Solid-State Electronics ◽

10.1016/s0038-1101(00)00073-3 ◽

2000 ◽

Vol 44 (7) ◽

pp. 1341

Author(s):

Aurangzeb Khan

Keyword(s):

Solid State ◽

Chemical Vapour Deposition ◽

Room Temperature ◽

Vapour Deposition ◽

Chemical Vapour ◽

Organic Chemical ◽

Solid State Electronics ◽

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Nanocrystalline Si : H thin films grown at room temperature with plasma-enhanced chemical vapour deposition at a very high pressure

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/45/33/335104 ◽

2012 ◽

Vol 45 (33) ◽

pp. 335104 ◽

Author(s):

L Gao ◽

N P Lu ◽

L G Liao ◽

A L Ji ◽

Z X Cao

Keyword(s):

High Pressure ◽

Chemical Vapour Deposition ◽

Room Temperature ◽

Vapour Deposition ◽

Chemical Vapour ◽

Very High ◽

Nanocrystalline Si

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