scholarly journals Thin films with high surface roughness: thickness and dielectric function analysis using spectroscopic ellipsometry

SpringerPlus ◽  
2014 ◽  
Vol 3 (1) ◽  
Author(s):  
Daniel Lehmann ◽  
Falko Seidel ◽  
Dietrich RT Zahn
CrystEngComm ◽  
2020 ◽  
Vol 22 (5) ◽  
pp. 969-978 ◽  
Author(s):  
Li Li ◽  
Liang Wang ◽  
Xinhong Chen ◽  
Changyuan Tao ◽  
Jun Du ◽  
...  

Bayberry-like mesoporous TiO2 hydrophilic films with high surface roughness and high density of surface hydroxyl groups.


2011 ◽  
Vol 314-316 ◽  
pp. 1107-1111
Author(s):  
Hong Bing Zhao ◽  
Ying Fei Nan

Deep hole honing is the primary way of finishing, the main problems existing now are the low efficiency, high surface roughness, especially in the processing of difficult to cut materials. In this study, the test is on the titanium alloy and uses the self-developed ultrasonic vibration honing equipment. The results show that in the same conditions, the ultrasonic vibration in deep-hole honing can improve the efficiency about 1 times, and meanwhile the surface roughness can reach below 0.8μm, the oilstone is uneasy to block, and the technical effects are better than traditional honing process.


2008 ◽  
Vol 123 (5) ◽  
pp. 2997-2997 ◽  
Author(s):  
Manish Arora ◽  
Costas Arvanitis ◽  
Emma Cox ◽  
Constantin C. Coussios

Coatings ◽  
2018 ◽  
Vol 8 (11) ◽  
pp. 413 ◽  
Author(s):  
Robert Müller ◽  
Lilit Ghazaryan ◽  
Paul Schenk ◽  
Sabrina Wolleb ◽  
Vivek Beladiya ◽  
...  

High-density ruthenium (Ru) thin films were deposited using Ru(EtCp)2 (bis(ethylcyclopentadienyl)ruthenium) and oxygen by thermal atomic layer deposition (ALD) and compared to magnetron sputtered (MS) Ru coatings. The ALD Ru film growth and surface roughness show a significant temperature dependence. At temperatures below 200 °C, no deposition was observed on silicon and fused silica substrates. With increasing deposition temperature, the nucleation of Ru starts and leads eventually to fully closed, polycrystalline coatings. The formation of blisters starts at temperatures above 275 °C because of poor adhesion properties, which results in a high surface roughness. The optimum deposition temperature is 250 °C in our tool and leads to rather smooth film surfaces, with roughness values of approximately 3 nm. The ALD Ru thin films have similar morphology compared with MS coatings, e.g., hexagonal polycrystalline structure and high density. Discrepancies of the optical properties can be explained by the higher roughness of ALD films compared to MS coatings. To use ALD Ru for optical applications at short wavelengths (λ = 2–50 nm), further improvement of their film quality is required.


2006 ◽  
Vol 51 (17) ◽  
pp. 3495-3499 ◽  
Author(s):  
Eugenijus Norkus ◽  
Algirdas Vaškelis ◽  
Janė Jačiauskienė ◽  
Irena Stalnionienė ◽  
Giedrius Stalnionis

2020 ◽  
Vol 107 ◽  
pp. 103041 ◽  
Author(s):  
Dapeng Xu ◽  
Zixiong Wang ◽  
Song Zhang ◽  
Wei Yang ◽  
Jian Chen

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