Microstructural evolution of tantalum nitride thin films synthesized by inductively coupled plasma sputtering

Applied Microscopy ◽

10.1186/s42649-020-00026-7 ◽

2020 ◽

Vol 50 (1) ◽

Author(s):

Sung-Il Baik ◽

Young-Woon Kim

Keyword(s):

Microstructural Evolution ◽

Inductively Coupled Plasma ◽

Tantalum Nitride ◽

Inductively Coupled ◽

Plasma Sputtering

Download Full-text

Synthesis of nitrogen-rich carbon nitride thin films via magnetic field-assisted inductively coupled plasma sputtering

Vacuum ◽

10.1016/j.vacuum.2005.11.042 ◽

2006 ◽

Vol 80 (7) ◽

pp. 752-755 ◽

Author(s):

R. Ohta ◽

T. Yokota ◽

V. Anita ◽

N. Saito ◽

O. Takai

Keyword(s):

Magnetic Field ◽

Inductively Coupled Plasma ◽

Carbon Nitride ◽

Inductively Coupled ◽

Plasma Sputtering

Download Full-text

Evolution of nanocrystalline diamond thin films by high-density low-pressure CH4 plasma in planar inductively coupled plasma CVD

10.1063/5.0016897 ◽

2020 ◽

Author(s):

Sucharita Saha ◽

Debajyoti Das

Keyword(s):

Inductively Coupled Plasma ◽

Low Pressure ◽

High Density ◽

Nanocrystalline Diamond ◽

Inductively Coupled ◽

Diamond Thin Films

Download Full-text

Device Relevant Doped Amorphous Silicon Thin Films by Inductively Coupled Plasma Enhanced Chemical Vapor Deposition

2018 IEEE 7th World Conference on Photovoltaic Energy Conversion (WCPEC) (A Joint Conference of 45th IEEE PVSC, 28th PVSEC & 34th EU PVSEC) ◽

10.1109/pvsc.2018.8548298 ◽

2018 ◽

Author(s):

Boon Heng TEO ◽

Jin LIU ◽

Jia GE ◽

Delio PEREZ ◽

Edwin CARMONA ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Inductively Coupled ◽

Silicon Thin Films

Download Full-text

Dry etching of magnesium oxide thin films by using inductively coupled plasma for buffer layer of MFIS structure

Thin Solid Films ◽

10.1016/j.tsf.2006.10.087 ◽

2007 ◽

Vol 515 (12) ◽

pp. 4955-4959 ◽

Author(s):

Gwan-Ha Kim ◽

Chang-Il Kim

Keyword(s):

Buffer Layer ◽

Magnesium Oxide ◽

Inductively Coupled Plasma ◽

Dry Etching ◽

Oxide Thin Films ◽

Inductively Coupled ◽

Download Full-text

Etching mechanism of (Pb,Sr)TiO3 thin films for DRAM application using Cl2/Ar inductively coupled plasma

Vacuum ◽

10.1016/j.vacuum.2004.01.018 ◽

2004 ◽

Vol 74 (3-4) ◽

pp. 485-489 ◽

Author(s):

Gwan-Ha Kim ◽

Kyoung-Tae Kim ◽

Dong-Pyo Kim ◽

Chang-Il Kim

Keyword(s):

Inductively Coupled Plasma ◽

Inductively Coupled ◽

Etching Mechanism

Download Full-text

Effect of silane/hydrogen ratio on microcrystalline silicon thin films by remote inductively coupled plasma

Journal of Applied Physics ◽

10.1063/1.4807404 ◽

2013 ◽

Vol 113 (20) ◽

pp. 203505 ◽

Author(s):

Y. N. Guo ◽

D. Y. Wei ◽

S. Q. Xiao ◽

S. Y. Huang ◽

H. P. Zhou ◽

...

Keyword(s):

Inductively Coupled Plasma ◽

Microcrystalline Silicon ◽

Inductively Coupled ◽

Silicon Thin Films

Download Full-text

Etching mechanisms of (Ba,Sr)TiO3 thin films in CF4/Ar inductively coupled plasma

Microelectronic Engineering ◽

10.1016/j.mee.2003.09.001 ◽

2004 ◽

Vol 71 (1) ◽

pp. 54-62 ◽

Author(s):

A.M Efremov ◽

Dong-Pyo Kim ◽

Kyoung-Tae Kim ◽

Chang-Il Kim

Keyword(s):

Inductively Coupled Plasma ◽

Inductively Coupled

Download Full-text

Nano-crystalline silicon thin films grown by the inductively coupled plasma assisted CFUBM at low temperature

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2010.07.086 ◽

2010 ◽

Vol 205 ◽

pp. S227-S230 ◽

Author(s):

Kyung S. Shin ◽

Yoon S. Choi ◽

In S. Choi ◽

Y. Setsuhara ◽

Jeon G. Han

Keyword(s):

Low Temperature ◽

Inductively Coupled Plasma ◽

Crystalline Silicon ◽

Inductively Coupled ◽

Silicon Thin Films ◽

Nano Crystalline

Download Full-text

Plasma-Enhanced Reactive Magnetron Sputtering Assisted with Inductively Coupled Plasma for Reactivity-Controlled Deposition of Microcrystalline Silicon Thin Films

Japanese Journal of Applied Physics ◽

10.7567/jjap.52.11nb05 ◽

2013 ◽

Vol 52 (11S) ◽

pp. 11NB05 ◽

Author(s):

Kosuke Takenaka ◽

Yuichi Setsuhara ◽

Akinori Ebe

Keyword(s):

Magnetron Sputtering ◽

Inductively Coupled Plasma ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Microcrystalline Silicon ◽

Inductively Coupled ◽

Silicon Thin Films ◽

Controlled Deposition

Download Full-text

(Pb,Sr)TiO3 thin films etching characteristics using inductively coupled plasma

Thin Solid Films ◽

10.1016/j.tsf.2003.09.007 ◽

2004 ◽

Vol 447-448 ◽

pp. 688-692 ◽

Author(s):

Gwan-Ha Kim ◽

Kyoung-Tae Kim ◽

Dong-Pyo Kim ◽

Chang-Il Kim

Keyword(s):

Inductively Coupled Plasma ◽

Inductively Coupled

Download Full-text