The development of an ultrahigh vacuum field emission electron microscope for the observation and analysis of crystal surfaces.

2022 ◽  
pp. 57-60
Author(s):  
M Takeguchi ◽  
T Honda ◽  
Y Ishida ◽  
A I Kirkland ◽  
M Tanaka ◽  
...  
Keyword(s):  
Electron Microscope ◽  
Field Emission ◽  
Ultrahigh Vacuum ◽  
Vacuum Field ◽  
Crystal Surfaces ◽  
Emission Electron

Characteristics and Application of Temperature-Field Emitters

1975 ◽  
Vol 33 ◽  
pp. 144-145
Author(s):  
N. Tamura ◽  
T. Goto ◽  
Y. Harada
Keyword(s):  
Temperature Field ◽  
Electron Microscope ◽  
Field Emission ◽  
Resolving Power ◽  
High Brightness ◽  
Field Emitters ◽  
Emission Electron ◽  
Sufficient Stability ◽  
Scanning Electron ◽  
Illuminating System

On account of its high brightness, the field emission electron source has the advantage that it provides the conventional electron microscope with highly coherent illuminating system and that it directly improves the, resolving power of the scanning electron microscope. The present authors have reported some results obtained with a 100 kV field emission electron microscope.It has been proven, furthermore, that the tungsten emitter as a temperature field emission source can be utilized with a sufficient stability under a modest vacuum of 10-8 ~ 10-9 Torr. The present paper is concerned with an extension of our study on the characteristics of the temperature field emitters.

Ultrahigh-Vacuum Field-Emission Electron Microscope as Applied to Observation and Analysis of Crystal Surface

1997 ◽  
Vol 3 (S2) ◽  
pp. 597-598
Author(s):  
M. Takeguchi ◽  
T. Honda ◽  
Y. Ishida ◽  
M. Kersker ◽  
M. Tanaka ◽  
...  
Keyword(s):  
Field Emission ◽  
Crystal Surface ◽  
Ultrahigh Vacuum ◽  
Atomic Scale ◽  
Vacuum Field ◽  
In Situ Observation ◽  
Probe Size ◽  
Point To Point ◽  
Lattice Resolution ◽  
Reaction Processes

UHV(ultrahigh-vacuum) TEM has long been used as a powerful tool for studying crystal surfaces, particularly for both the direct imaging of the surface structure and for in-situ observation of surface reaction processes with atomic resolution.This paper reports a newly developed 200kV UHV TEM equipped with a field emission gun(FEG). The instrument is designed to obtain information about elemental or bonding states of surfaces in addition to observation of surface atomic structure with high contrast. Basic performances of the UHV FE-TEM includes a specimen vacuum of 2.0X10-8Pa, probe size less than 1.0nm Ø with 0.5nA probe current, point-to-point resolution of 0.21 nm, and a lattice resolution of 0.10nm.A UHV Energy Dispersive X-ray Spectrometer (EDS) originally developed by JEOL Ltd. and a Parallel Electron Energy Loss Spectrometer (PEELS) are attached to the UHV FE-TEM, which combined with a fine focused probe of 1.Onm Ø allows atomic scale spectroscopy of surfaces.

Grain Boundary Phase Analysis of Silicon Nitride by a Newly Developed 300kv Field-Emission Electron Microscope

1994 ◽  
Vol 346 ◽  
Author(s):  
Y. Bando ◽  
H. Suematsu ◽  
M. Mitomo
Keyword(s):  
Electron Microscope ◽  
Silicon Nitride ◽  
Grain Boundary ◽  
Grain Boundaries ◽  
Phase Analysis ◽  
Field Emission ◽  
Boundary Phase ◽  
Emission Electron ◽  
Triple Points

ABSTRACTThe grain boundary phase of silicon nitride containing additives Y2O3 and Nd2O3 has been studied by means of a newly developed 300kV field emission ATEM. The composition of the two-grain boundary phase of about 1 nm thick is successfully determined. It is then found that the compositions among the grain boundaries are not the same and the additives of Y2O3-Nd2O3 are poor in the two-grain boundary, while they are rich in the triple points.

Carbon nanotubes grown in a field emission electron microscope

2012 ◽  
Author(s):  
Alina Pascale ◽  
Sorin Perisanu ◽  
Arnaud Derouet ◽  
Anthony Ayari ◽  
Philipppe Poncharal ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Electron Microscope ◽  
Field Emission ◽  
Emission Electron
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