Ultrahigh-Vacuum Field-Emission Electron Microscope as Applied to Observation and Analysis of Crystal Surface

1997 ◽  
Vol 3 (S2) ◽  
pp. 597-598
Author(s):  
M. Takeguchi ◽  
T. Honda ◽  
Y. Ishida ◽  
M. Kersker ◽  
M. Tanaka ◽  
...  
Keyword(s):  
Field Emission ◽  
Crystal Surface ◽  
Ultrahigh Vacuum ◽  
Atomic Scale ◽  
Vacuum Field ◽  
In Situ Observation ◽  
Probe Size ◽  
Point To Point ◽  
Lattice Resolution ◽  
Reaction Processes

UHV(ultrahigh-vacuum) TEM has long been used as a powerful tool for studying crystal surfaces, particularly for both the direct imaging of the surface structure and for in-situ observation of surface reaction processes with atomic resolution.This paper reports a newly developed 200kV UHV TEM equipped with a field emission gun(FEG). The instrument is designed to obtain information about elemental or bonding states of surfaces in addition to observation of surface atomic structure with high contrast. Basic performances of the UHV FE-TEM includes a specimen vacuum of 2.0X10-8Pa, probe size less than 1.0nm Ø with 0.5nA probe current, point-to-point resolution of 0.21 nm, and a lattice resolution of 0.10nm.A UHV Energy Dispersive X-ray Spectrometer (EDS) originally developed by JEOL Ltd. and a Parallel Electron Energy Loss Spectrometer (PEELS) are attached to the UHV FE-TEM, which combined with a fine focused probe of 1.Onm Ø allows atomic scale spectroscopy of surfaces.

Development and Application of a New 300kv Omega-Filter Electron Microscope

2000 ◽  
Vol 6 (S2) ◽  
pp. 200-201
Author(s):  
Y. Bando ◽  
M. Mitome ◽  
Y. Kitami ◽  
K. Kurashima ◽  
T. Kaneyama ◽  
...  
Keyword(s):  
Electron Microscope ◽  
Field Emission ◽  
Spatial Resolution ◽  
Imaging Plate ◽  
Medium Voltage ◽  
Probe Current ◽  
Probe Diameter ◽  
Probe Size ◽  
Characteristic Features ◽  
Lattice Resolution

It has been already pointed out that the medium voltage microscopes of 300kV to 400kV have some advantages in the analytical capabilities of EDS and EELS as compared to those of 200kV). The P/B ratios and the spatial resolution for the analysis will be improved with the increase of the accelerating voltages as well as lattice resolution. In order to improve the spatial resolution of inelastic filtered images, we have recently developed a new 300 kV omega-filter electron microscope with a field emission gun. In the paper, some characteristic features of the new microscope and its application results are described.The new microscope have a 300kV field emission gun, an omega-filter, EDS, digital STEM, a slow-scan CCD, an imaging plate and TV camera. Some characteristic features of the new microscope are summarized in Table 1. Based on a calculation of probe diameter as a function of probe current at 300kV in a Shottkey type gun with a brightness of 7xl08A/cm2sr and Cs of 0.6mm, a minimum probe size (FWHM) is estimated to be about 0.2nm (Fig. 1).

Structure and migration of planar defects in crystals observed in atomic scale

1978 ◽  
Vol 36 (1) ◽  
pp. 284-285 ◽  
Author(s):  
H. Hashimoto ◽  
Y. Sugimoto ◽  
Y. Takai ◽  
H. Endoh
Keyword(s):  
Electron Microscope ◽  
Rotation Angle ◽  
Crystal Surface ◽  
Electron Gun ◽  
Atomic Scale ◽  
Present Observation ◽  
Twist Boundary ◽  
Optical Magnification ◽  
Zinc Crystal ◽  
And Migration

As was demonstrated by the present authors that atomic structure of simple crystal can be photographed by the conventional 100 kV electron microscope adjusted at “aberration free focus (AFF)” condition. In order to operate the microscope at AFF condition effectively, highly stabilized electron beams with small energy spread and small beam divergence are necessary. In the present observation, a 120 kV electron microscope with LaB6 electron gun was used. The most of the images were taken with the direct electron optical magnification of 1.3 million times and then magnified photographically.1. Twist boundary of ZnSFig. 1 is the image of wurtzite single crystal with twist boundary grown on the surface of zinc crystal by the reaction of sulphur vapour of 1540 Torr at 500°C. Crystal surface is parallel to (00.1) plane and electron beam is incident along the axis normal to the crystal surface. In the twist boundary there is a dislocation net work between two perfect crystals with a certain rotation angle.

Atomic resolution AEM (ARAEM) of oxide superconductors

1992 ◽  
Vol 50 (1) ◽  
pp. 74-75
Author(s):  
Vinayak P. Dravid ◽  
H. Zhang ◽  
L.D. Marks ◽  
J.P. Zhang
Keyword(s):  
Electron Microscope ◽  
Field Emission ◽  
Atomic Resolution ◽  
Oxide Superconductors ◽  
Electron Holography ◽  
Analytical Electron ◽  
Analytical Electron Microscope ◽  
Point To Point ◽  
Single Instrument ◽  
Better Than

A 200 kV cold field emission gun atomic resolution analytical electron microscope (ARAEM, Hitachi HF-2000) has been recently installed at Northwestern. The ARAEM offers an unprecedented combination of atomic structure imaging of better than 0.20 nm nominal point-to-point resolution and about 0.10 nm line resolution, alongwith nanoscale analytical capabilities and electron holography in one single instrument. The ARAEM has been fully functional/operational and this paper presents some illustrative examples of application of ARAEM techniques to oxide superconductors. Additional results will be presented at the meeting.

Ultrahigh-Vacuum Electron Microscopy for Gold Nanostructures

2001 ◽  
Vol 7 (S2) ◽  
pp. 920-921
Author(s):  
Yukihito Kondo ◽  
Kimiharu Okamoto ◽  
Mikio Naruse ◽  
Toshikazu Honda ◽  
Mike Kersker
Keyword(s):  
Electron Microscopy ◽  
Field Emission ◽  
Electronic Devices ◽  
Ultrahigh Vacuum ◽  
Gold Nanostructures ◽  
Scanning Tunneling ◽  
Nano Scale ◽  
Transmission Electron ◽  
Column Type ◽  
Schottky Type

Ultrahigh-vacuum transmission electron microscopy (UHVTEM) has become increasingly popular for the direct observation of nanostructures having clean surfaces, since industrial requirements to make and research nano-scale materials have been rapidly growing for quantum or nanoscale electronic devices. Since we have first developed high resolution UHVTEM in 1986, the UHVTEMs have been evolved with steady advances such as UHV compatible goniometer, field emission gun or etc. Furthermore, the UHVTEM started to combine analytical capabilities such as energy dispersive X-ray spectrometer, in-column type energy filter and etc., and to combine STM (scanning tunneling microscope). The UHV technology is essential for the analysis, because the portion of contaminant in a nano-scale specimen increases as the size of the specimen goes down. This paper reports the results of gold nanostructures by recently the developed UHVTEM.Figure 1 shows recently developed UHVTEM with Schottky type field emission gun.

scholarly journals In Situ Observation of Electron-Beam-Induced Formation of Nano-Structures in PbTe

Nanomaterials ◽  
2021 ◽  
Vol 11 (1) ◽  
pp. 163
Author(s):  
Iryna Zelenina ◽  
Igor Veremchuk ◽  
Yuri Grin ◽  
Paul Simon
Keyword(s):  
Electron Beam ◽  
Gas Phase ◽  
Threshold Current ◽  
Threshold Current Density ◽  
Atomic Scale ◽  
In Situ Observation ◽  
Nano Structures ◽  
Transmission Electron ◽  
Initial Crystal

Nano-scaled thermoelectric materials attract significant interest due to their improved physical properties as compared to bulk materials. Well-shaped nanoparticles such as nano-bars and nano-cubes were observed in the known thermoelectric material PbTe. Their extended two-dimensional nano-layer arrangements form directly in situ through electron-beam treatment in the transmission electron microscope. The experiments show the atomistic depletion mechanism of the initial crystal and the recrystallization of PbTe nanoparticles out of the microparticles due to the local atomic-scale transport via the gas phase beyond a threshold current density of the beam.

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