The electronic transport mechanism in indium molybdenum oxide thin films RF sputtered at room temperature

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2009 ◽  
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N. Fieldhouse ◽  
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...  

2021 ◽  
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Thomas Tom ◽  
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Jose Miguel Asensi ◽  
Eloi Ros ◽  
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2020 ◽  
Vol 9 (5) ◽  
pp. 10624-10634
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Nurul Assikin Ariffin ◽  
Ahmed Lateef Khalaf ◽  
Mohd. Hanif Yaacob ◽  
Nizam Tamchek ◽  
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Helen Lai Wah Chan ◽  
Chung Loong Choy

2019 ◽  
Vol 14 (29) ◽  
pp. 37-43 ◽  
Author(s):  
Raied K. Jamal

The electrical properties of pure NiO and NiO:Au Films which aredeposited on glass substrate with various dopant concentrations(1wt.%, 2wt%, 3wt.% and 4wt.%) at room temperature 450 Coannealing temperature will be presented. The results of the hall effectshowed that all the films were p-type. The Hall mobility decreaseswhile both carrier concentration and conductivity increases with theincreasing of annealing temperatures and doping percentage, Thus,indicating the behavior of semiconductor, and also the D.Cconductivity from which the activation energy decrease with thedoping concentration increase and transport mechanism of the chargecarriers can be estimated.


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