2107 Adaptive Lot Release Using Genetics Based Machine Learning in a Semiconductor Manufacturing System

2006 ◽  
Vol 2006 (0) ◽  
pp. 31-32 ◽  
Author(s):  
Nobutada FUJII ◽  
Motohiro KOBAYASHI ◽  
Kanji UEDA
Keyword(s):  
Machine Learning ◽  
Semiconductor Manufacturing ◽  
Manufacturing System

scholarly journals Utilizing an Adaptive Grey Model for Short-Term Time Series Forecasting: A Case Study of Wafer-Level Packaging

2013 ◽  
Vol 2013 ◽  
pp. 1-6 ◽  
Author(s):  
Che-Jung Chang ◽  
Der-Chiang Li ◽  
Wen-Li Dai ◽  
Chien-Chih Chen
Keyword(s):  
Semiconductor Manufacturing ◽  
Manufacturing System ◽  
Grey System Theory ◽  
Grey Model ◽  
Grey System ◽  
Wafer Level ◽  
Short Term ◽  
Packaging Process ◽  
Wafer Level Packaging

The wafer-level packaging process is an important technology used in semiconductor manufacturing, and how to effectively control this manufacturing system is thus an important issue for packaging firms. One way to aid in this process is to use a forecasting tool. However, the number of observations collected in the early stages of this process is usually too few to use with traditional forecasting techniques, and thus inaccurate results are obtained. One potential solution to this problem is the use of grey system theory, with its feature of small dataset modeling. This study thus uses the AGM(1,1) grey model to solve the problem of forecasting in the pilot run stage of the packaging process. The experimental results show that the grey approach is an appropriate and effective forecasting tool for use with small datasets and that it can be applied to improve the wafer-level packaging process.

Design and Algorithm of Intelligent Manufacturing Evaluation Model Based on Machine Learning

2021 ◽  
Author(s):  
Xianwang Li ◽  
Zhongxiang Huang ◽  
Wenhui Ning
Keyword(s):  
Machine Learning ◽  
Genetic Algorithm ◽  
Manufacturing System ◽  
Learning Algorithm ◽  
Intelligent Manufacturing ◽  
System Model ◽  
Machine Learning Algorithm ◽  
Model Design ◽  
Bp Network ◽  
Intelligent Manufacturing System

Abstract Machine learning is gradually developed and applied to more and more fields. Intelligent manufacturing system is also an important system model that many companies and enterprises are designing and implementing. The purpose of this study is to evaluate and analyze the model design of Intelligent Manufacturing System Based on machine learning algorithm. The method of this study is to first obtain all the relevant attributes of the intelligent manufacturing system model, and then use machine learning algorithm to delete irrelevant attributes to prevent redundancy and deviation of neural network fitting, make the original probability distribution as close as possible to the distribution when using the selected attributes, and use the ratio of industry average to quantitative expression for measurable and obvious data indicators. As a result, the average running time of the intelligent manufacturing system is 17.35 seconds, and the genetic algorithm occupies 15.63 seconds. The machine learning network takes up 1.72 seconds. Under the machine learning algorithm, the training speed is very high, obviously higher than that of the genetic algorithm, and the BP network is 2.1% higher than the Elman algorithm. The evaluation running speed of the system model design is fast and the accuracy is high. This study provides a certain value for the model design evaluation and algorithm of various systems in the intelligent era.

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