Effect of Sputtering Gas Pressure and Bias Voltage on Mechanical Properties of TiN Film Deposited by D. C. Magnetron Sputtering
2003 ◽
Vol 2003
(0)
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pp. 447-448
2003 ◽
Vol 52
(6Appendix)
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pp. 143-148
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2003 ◽
Vol 2003.78
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pp. _2-1_-_2-2_
2002 ◽
Vol 51
(6)
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pp. 694-700
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2011 ◽
Vol 189-193
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pp. 901-905
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2011 ◽
Vol 11
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pp. 1758-1761
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2009 ◽
Vol 11
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pp. 38-41
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2004 ◽
Vol 70
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pp. 636-641
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