Low temperature plasma chemical vapor deposition of silicon oxynitride thin-film waveguides

Applied Optics ◽

10.1364/ao.23.002744 ◽

1984 ◽

Vol 23 (16) ◽

pp. 2744 ◽

Author(s):

D. K. W. Lam

Keyword(s):

Thin Film ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Oxynitride ◽

Low Temperature Plasma ◽

Plasma Chemical ◽

Temperature Plasma ◽

Plasma Chemical Vapor Deposition ◽

Thin Film Waveguides

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Synthesis of carbon clusters and thin films by low temperature plasma chemical vapor deposition under atmospheric pressure

Pure and Applied Chemistry ◽

10.1351/pac199668051151 ◽

1996 ◽

Vol 68 (5) ◽

pp. 1151-1154 ◽

Author(s):

H. Koinuma ◽

Takao Horiuchi ◽

Kiyoto Inomata ◽

H.-K. Ha ◽

K. Nakajima ◽

...

Keyword(s):

Low Temperature ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Carbon Clusters ◽

Low Temperature Plasma ◽

Plasma Chemical ◽

Temperature Plasma ◽

Plasma Chemical Vapor Deposition

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Low temperature plasma chemical vapor deposition (PCVD) of fluorinated tin-oxide transparent conducting oxide

2009 34th IEEE Photovoltaic Specialists Conference (PVSC) ◽

10.1109/pvsc.2009.5411348 ◽

2009 ◽

Author(s):

Haripin Chandra ◽

Mark A. George ◽

John Madocks

Keyword(s):

Low Temperature ◽

Tin Oxide ◽

Vapor Deposition ◽

Transparent Conducting Oxide ◽

Chemical Vapor ◽

Low Temperature Plasma ◽

Plasma Chemical ◽

Temperature Plasma ◽

Plasma Chemical Vapor Deposition ◽

Transparent Conducting

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Properties of SiO N thin film deposited by low temperature plasma enhanced chemical vapor deposition using TEOS–NH3–O2–N2 gas mixtures

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2005.01.119 ◽

2005 ◽

Vol 200 (1-4) ◽

pp. 680-685 ◽

Author(s):

J.H. Lee ◽

C.H. Jeong ◽

J.T. Lim ◽

N.G. Jo ◽

S.J. Kyung ◽

...

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Gas Mixtures ◽

Low Temperature Plasma ◽

Temperature Plasma

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Hydrogen-assisted low-temperature plasma-enhanced chemical vapor deposition of thin film encapsulation layers for top-emission organic light-emitting diodes

Organic Electronics ◽

10.1016/j.orgel.2021.106261 ◽

2021 ◽

pp. 106261

Author(s):

Junmo Kim ◽

Jeong Ha Hwang ◽

Yong Woo Kwon ◽

Hyeong Woo Bae ◽

Myungchan An ◽

...

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Light Emitting Diodes ◽

Low Temperature Plasma ◽

Temperature Plasma ◽

Light Emitting ◽

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Nanocrystalline TiO2 thin film prepared by low-temperature plasma-enhanced chemical vapor deposition for photocatalytic applications

Thin Solid Films ◽

10.1016/j.tsf.2015.07.007 ◽

2015 ◽

Vol 589 ◽

pp. 770-777 ◽

Author(s):

Ming Zhou ◽

Stéphanie Roualdès ◽

Jie Zhao ◽

Vincent Autès ◽

André Ayral

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Tio2 Thin Film ◽

Chemical Vapor ◽

Low Temperature Plasma ◽

Nanocrystalline Tio2 ◽

Temperature Plasma ◽

Photocatalytic Applications

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LOW TEMPERATURE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF CARBON FILMS ON DIFFERENT SUBSTRATES

High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes ◽

10.1615/hightempmatproc.v10.i3.90 ◽

2006 ◽

Vol 10 (3) ◽

pp. 457-466

Author(s):

A. Ya. Vinogradov ◽

A. N. Andronov ◽

A. B Ustinov ◽

K. E. Orlov ◽

A. S. Smirnov

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Low Temperature Plasma ◽

Temperature Plasma

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Structural properties of polycrystalline silicon films prepared at low temperature by plasma chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.349732 ◽

1991 ◽

Vol 70 (12) ◽

pp. 7374-7381 ◽

Author(s):

H. Kakinuma ◽

M. Mohri ◽

M. Sakamoto ◽

T. Tsuruoka

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Structural Properties ◽

Vapor Deposition ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Polycrystalline Silicon Films

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Cubic boron nitride thin film synthesis on silica substrates by low-pressure inductively-coupled r.f. plasma chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(99)00540-4 ◽

1999 ◽

Vol 354 (1-2) ◽

pp. 24-28 ◽

Author(s):

K.K. Chattopadhyay ◽

S. Matsumoto ◽

Y.-F. Zhang ◽

I. Sakaguchi ◽

M. Nishitani-Gamo ◽

...

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Boron Nitride ◽

Vapor Deposition ◽

Cubic Boron Nitride ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

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Low Temperature Heteroepitaxial Growth of 3C-SiC on Silicon Substrates by Triode Plasma Chemical Vapor Deposition using Dimethylsilane

Journal of Applied Sciences ◽

10.3923/jas.2008.3523.3527 ◽

2008 ◽

Vol 8 (19) ◽

pp. 3523-3527 ◽

Author(s):

A.M. Hashim ◽

K. Yasui

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Substrates ◽

Heteroepitaxial Growth ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Intrinsic Amorphous Silicon (a-Si:H) Thin Film Prepared by Using Remote Plasma Chemical Vapor Deposition Method and Used as a Passivation Layer for a Heterojunction Solar Cell

Journal of the Korean Physical Society ◽

10.3938/jkps.54.194 ◽

2009 ◽

Vol 54 (1) ◽

pp. 194-199 ◽

Author(s):

Minsung Jeon ◽

Shuhei Yoshiba ◽

Koichi Kamisako

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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