Enhanced normal-incidence Goos-Hänchen effects induced by magnetic surface plasmons in magneto-optical metamaterials

Abstract In this work, we report on near-field studying of propagating surface plasmons (SPs) in one-dimensional magnetoplasmonic crystals (MPCs) by aperture type scanning near-field optical microscopy (SNOM). Optical near-field around the aperture probe is used to drive SPs in the MPC locally. The SNOM signal represents the scattered intensity caused by the interaction of the SNOM probe near-field with the MPC. Scanning the MPC surface with polarization resolving of the scattered radiation shows decreasing of the intensity due to the SP excitation. The observed polarization dependence of the scattered SNOM signal is associated with the selective coupling of the near-field components of the SNOM probe with SPs. Finite-difference time-domain simulations reproduce the experimental SNOM signal. It is shown the excitation of SPs with symmetric (even parity) field distribution, which is forbidden for plane wave source at normal incidence.

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Experimental characterization of magnetic surface plasmons on metamaterials with negative permeability

Physical Review B ◽

10.1103/physrevb.71.195402 ◽

2005 ◽

Vol 71 (19) ◽

Cited By ~ 63

Author(s):

Jonah N. Gollub ◽

David R. Smith ◽

David C. Vier ◽

Tim Perram ◽

Jack J. Mock

Keyword(s):

Surface Plasmons ◽

Magnetic Surface ◽

Negative Permeability ◽

Experimental Characterization

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Transverse magnetic surface plasmons and complete absorption supported by doped graphene in Otto configuration

AIP Advances ◽

10.1063/1.4883885 ◽

2014 ◽

Vol 4 (6) ◽

pp. 067125 ◽

Cited By ~ 14

Author(s):

F. Ramos-Mendieta ◽

J. A. Hernández-López ◽

M. Palomino-Ovando

Keyword(s):

Surface Plasmons ◽

Transverse Magnetic ◽

Magnetic Surface ◽

Complete Absorption ◽

Doped Graphene

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Analysis of Contrast Reversal in SEM Images

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s042482010009525x ◽

1972 ◽

Vol 30 ◽

pp. 398-399

Author(s):

M. D. Coutts ◽

E. R. Levin

Keyword(s):

Incident Beam ◽

Normal Incidence ◽

Beam Current ◽

Secondary Emission ◽

Image Contrast ◽

Sem Images ◽

Secondary Electrons ◽

Image Position

On tilting samples in an SEM, the image contrast between two elements, x and y often decreases to zero at θε, which we call the no-contrast angle. At angles above θε the contrast is reversed, θ being the angle between the specimen normal and the incident beam. The available contrast between two elements, x and y, in the SEM can be defined as,(1)where ix and iy are the total number of reflected and secondary electrons, leaving x and y respectively. It can easily be shown that for the element x,(2)where ib is the beam current, isp the specimen absorbed current, δo the secondary emission at normal incidence, k is a constant, and m the reflected electron coefficient.

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Characterization of Rh/Si multilayer structure by HREM and HAADF

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100121016 ◽

1992 ◽

Vol 50 (1) ◽

pp. 122-123

Author(s):

Y. Cheng ◽

J. Liu ◽

M.B. Stearns ◽

D.G. Steams

Keyword(s):

Normal Incidence ◽

High Resolution Electron Microscopy ◽

X Rays ◽

Beam Direction ◽

Cross Sectional ◽

Optical Elements ◽

Resolution Electron ◽

Point To Point ◽

Better Than

The Rh/Si multilayer (ML) thin films are promising optical elements for soft x-rays since they have a calculated normal incidence reflectivity of ∼60% at a x-ray wavelength of ∼13 nm. However, a reflectivity of only 28% has been attained to date for ML fabricated by dc magnetron sputtering. In order to determine the cause of this degraded reflectivity the microstructure of this ML was examined on cross-sectional specimens with two high-resolution electron microscopy (HREM and HAADF) techniques.Cross-sectional specimens were made from an as-prepared ML sample and from the same ML annealed at 298 °C for 1 and 100 hours. The specimens were imaged using a JEM-4000EX TEM operating at 400 kV with a point-to-point resolution of better than 0.17 nm. The specimens were viewed along Si [110] projection of the substrate, with the (001) Si surface plane parallel to the beam direction.

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On resolving fine periodic microstructures in the optical microscope

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100153798 ◽

1989 ◽

Vol 47 ◽

pp. 364-365

Author(s):

W.S. Putnam ◽

C. Viney

Keyword(s):

Liquid Crystalline ◽

Numerical Aperture ◽

Polarized Light ◽

Normal Incidence ◽

Optical Microscope ◽

Angle Of Incidence ◽

Resolution Limit ◽

Crystalline Materials ◽

Periodic Microstructures ◽

Liquid Crystalline Materials

Many sheared liquid crystalline materials (fibers, films and moldings) exhibit a fine banded microstructure when observed in the polarized light microscope. In some cases, for example Kevlar® fiber, the periodicity is close to the resolution limit of even the highest numerical aperture objectives. The periodic microstructure reflects a non-uniform alignment of the constituent molecules, and consequently is an indication that the mechanical properties will be less than optimal. Thus it is necessary to obtain quality micrographs for characterization, which in turn requires that fine detail should contribute significantly to image formation.It is textbook knowledge that the resolution achievable with a given microscope objective (numerical aperture NA) and a given wavelength of light (λ) increases as the angle of incidence of light at the specimen surface is increased. Stated in terms of the Abbe resolution criterion, resolution improves from λ/NA to λ/2NA with increasing departure from normal incidence.

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