Ultra Thin Foil Welding with Direct Diode Laser

2008 ◽  
Vol 128 (5) ◽  
pp. 703-706
Author(s):  
Nobuyuki Abe ◽  
Yoshinori Funada
Keyword(s):  
Diode Laser ◽  
Thin Foil

scholarly journals Thin foil welding with direct diode laser

2007 ◽  
Vol 35 (Supplement) ◽  
pp. 114-115
Author(s):  
Nobuyuki Abe ◽  
Yoshinori Funada
Keyword(s):  
Diode Laser ◽  
Thin Foil

Micro-welding of thin foil with direct diode laser

2003 ◽  
Author(s):  
Nobuyuki Abe ◽  
Yoshinori Funada ◽  
Masahiro Ishide
Keyword(s):  
Diode Laser ◽  
Thin Foil

Radiation-Induced Precipitation at Thin Foil Surfaces in Ni-Be Alloys

1982 ◽  
Vol 40 ◽  
pp. 598-599
Author(s):  
T. Mukai ◽  
T. E. Mitchell
Keyword(s):  
Electron Microscopy ◽  
High Voltage ◽  
Electron Irradiation ◽  
High Vacuum ◽  
Thin Foil ◽  
Homogeneous Precipitation ◽  
High Voltage Electron Microscopy ◽  
Voltage Electron ◽  
High Voltage Electron ◽  
Radiation Induced

Radiation-induced homogeneous precipitation in Ni-Be alloys was recently observed by high voltage electron microscopy. A coupling of interstitial flux with solute Be atoms is responsible for the precipitation. The present investigation further shows that precipitation is also induced at thin foil surfaces by electron irradiation under a high vacuum.

Electrolytic Isolation of Twin-Type Shock Deformation Structures

1967 ◽  
Vol 25 ◽  
pp. 318-319
Author(s):  
F. I. Grace ◽  
L. E. Murr
Keyword(s):  
Grain Boundaries ◽  
Thin Foil ◽  
Electrolyte Composition ◽  
Experimental Conditions ◽  
Average Current Density ◽  
Electron Transmission ◽  
Deformation Structures ◽  
The Matrix ◽  
Average Current ◽  
Specimen Edge

During the course of electron transmission investigations of the deformation structures associated with shock-loaded thin foil specimens of 70/30 brass, it was observed that in a number of instances preferential etching occurred along grain boundaries; and that the degree of etching appeared to depend upon the various experimental conditions prevailing during electropolishing. These included the electrolyte composition, the average current density, and the temperature in the vicinity of the specimen. In the specific case of 70/30 brass shock-loaded at pressures in the range 200-400 kilobars, the predominant mode of deformation was observed to be twin-type faults which in several cases exhibited preferential etching similar to that observed along grain boundaries. A novel feature of this particular phenomenon was that in certain cases, especially for twins located in the vicinity of the specimen edge, the etching or preferential electropolishing literally isolated these structures from the matrix.

Influence of X-Ray Induced Fluorescence on Energy Dispersive X-Ray Analysis of Thin Foils

1977 ◽  
Vol 35 ◽  
pp. 328-329
Author(s):  
E. A. Kenik ◽  
J. Bentley
Keyword(s):  
Thin Foil ◽  
Electron Excitation ◽  
Simple Approach ◽  
Foil Thickness ◽  
X Rays ◽  
X Ray ◽  
Hole Spectrum ◽  
Illumination System ◽  
Thin Foils ◽  
Intensity Ratios

Cliff and Lorimer (1) have proposed a simple approach to thin foil x-ray analy sis based on the ratio of x-ray peak intensities. However, there are several experimental pitfalls which must be recognized in obtaining the desired x-ray intensities. Undesirable x-ray induced fluorescence of the specimen can result from various mechanisms and leads to x-ray intensities not characteristic of electron excitation and further results in incorrect intensity ratios.In measuring the x-ray intensity ratio for NiAl as a function of foil thickness, Zaluzec and Fraser (2) found the ratio was not constant for thicknesses where absorption could be neglected. They demonstrated that this effect originated from x-ray induced fluorescence by blocking the beam with lead foil. The primary x-rays arise in the illumination system and result in varying intensity ratios and a finite x-ray spectrum even when the specimen is not intercepting the electron beam, an ‘in-hole’ spectrum. We have developed a second technique for detecting x-ray induced fluorescence based on the magnitude of the ‘in-hole’ spectrum with different filament emission currents and condenser apertures.

Optimizing conditions for x-ray microchemical analysis in analytical electron microscopy

1978 ◽  
Vol 36 (1) ◽  
pp. 548-549 ◽  
Author(s):  
N. J. Zaluzec
Keyword(s):  
Solid Angle ◽  
Analytical Electron Microscopy ◽  
Incident Beam ◽  
Thin Foil ◽  
Experimental Conditions ◽  
X Ray ◽  
Microchemical Analysis ◽  
Analytical Electron ◽  
Image Position ◽  
Incident Beam Energy

The ultimate sensitivity of microchemical analysis using x-ray emission rests in selecting those experimental conditions which will maximize the measured peak-to-background (P/B) ratio. This paper presents the results of calculations aimed at determining the influence of incident beam energy, detector/specimen geometry and specimen composition on the P/B ratio for ideally thin samples (i.e., the effects of scattering and absorption are considered negligible). As such it is assumed that the complications resulting from system peaks, bremsstrahlung fluorescence, electron tails and specimen contamination have been eliminated and that one needs only to consider the physics of the generation/emission process.The number of characteristic x-ray photons (Ip) emitted from a thin foil of thickness dt into the solid angle dΩ is given by the well-known equation

Precipitation in silicon: Microanalysis

1988 ◽  
Vol 46 ◽  
pp. 474-475
Author(s):  
R.W. Carpenter
Keyword(s):  
Transition Metals ◽  
Spatial Resolution ◽  
Thin Foil ◽  
Precipitation Reaction ◽  
High Current ◽  
Reaction Products ◽  
Carbon And Nitrogen ◽  
Dielectric Layers ◽  
Precipitation Processes ◽  
Areas Of Interest

Interest in precipitation processes in silicon appears to be centered on transition metals (for intrinsic and extrinsic gettering), and oxygen and carbon in thermally aged materials, and on oxygen, carbon, and nitrogen in ion implanted materials to form buried dielectric layers. A steadily increasing number of applications of microanalysis to these problems are appearing. but still far less than the number of imaging/diffraction investigations. Microanalysis applications appear to be paced by instrumentation development. The precipitation reaction products are small and the presence of carbon is often an important consideration. Small high current probes are important and cryogenic specimen holders are required for consistent suppression of contamination buildup on specimen areas of interest. Focussed probes useful for microanalysis should be in the range of 0.1 to 1nA, and estimates of spatial resolution to be expected for thin foil specimens can be made from the curves shown in Fig. 1.

Applications of Through-Focus Dark Field Image Shifts to Phase Identification

1975 ◽  
Vol 33 ◽  
pp. 178-179
Author(s):  
Prakash Rao
Keyword(s):  
Dark Field Image ◽  
Thin Foil ◽  
Dark Field ◽  
The Other ◽  
Stereo Image ◽  
Phase Identification ◽  
The Past ◽  
Field Electron Microscopy ◽  
Dark Field Electron ◽  
Recent Extension

Image shifts in out-of-focus dark field images have been used in the past to determine, for example, epitaxial relationships in thin films. A recent extension of the use of dark field image shifts has been to out-of-focus images in conjunction with stereoviewing to produce an artificial stereo image effect. The technique, called through-focus dark field electron microscopy or 2-1/2D microscopy, basically involves obtaining two beam-tilted dark field images such that one is slightly over-focus and the other slightly under-focus, followed by examination of the two images through a conventional stereoviewer. The elevation differences so produced are usually unrelated to object positions in the thin foil and no specimen tilting is required.In order to produce this artificial stereo effect for the purpose of phase separation and identification, it is first necessary to select a region of the diffraction pattern containing more than just one discrete spot, with the objective aperture.

Transmission electron microscope studies in special ceramics

1978 ◽  
Vol 36 (1) ◽  
pp. 268-269
Author(s):  
A. Zangvil ◽  
L.J. Gauckler ◽  
G. Schneider ◽  
M. Rühle
Keyword(s):  
Phase Diagrams ◽  
Crystal Structures ◽  
Thin Foil ◽  
Limited Extent ◽  
Complex Materials ◽  
X Ray Diffraction ◽  
X Ray ◽  
Transmission Electron ◽  
Electron Microscopes ◽  
Lattice Resolution

The use of high temperature special ceramics which are usually complex materials based on oxides, nitrides, carbides and borides of silicon and aluminum, is critically dependent on their thermomechanical and other physical properties. The investigations of the phase diagrams, crystal structures and microstructural features are essential for better understanding of the macro-properties. Phase diagrams and crystal structures have been studied mainly by X-ray diffraction (XRD). Transmission electron microscopy (TEM) has contributed to this field to a very limited extent; it has been used more extensively in the study of microstructure, phase transformations and lattice defects. Often only TEM can give solutions to numerous problems in the above fields, since the various phases exist in extremely fine grains and subgrain structures; single crystals of appreciable size are often not available. Examples with some of our experimental results from two multicomponent systems are presented here. The standard ion thinning technique was used for the preparation of thin foil samples, which were then investigated with JEOL 200A and Siemens ELMISKOP 102 (for the lattice resolution work) electron microscopes.

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