Micro-Raman characterization of Ge diffusion and Si stress change in thin epitaxial Si1−xGex layers on Si(100) after rapid thermal annealing
2012 ◽
Vol 27
(9)
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pp. 1314-1323
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Keyword(s):
Abstract
1999 ◽
Vol 144-145
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pp. 697-701
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Keyword(s):
2003 ◽
Vol 43
(8)
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pp. 1289-1293
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Keyword(s):