Ion beam energy dependence of surface and structural properties of amorphous carbon films deposited by IBSD method on Ni–Cu alloy

2017 ◽  
Vol 32 (07) ◽  
pp. 1258-1266 ◽  
Author(s):  
Elham Mohagheghpour ◽  
Marjan Rajabi ◽  
Reza Gholamipour ◽  
Majid M. Larijani ◽  
Shahab Sheibani
Keyword(s):  
Structural Properties ◽  
Energy Dependence ◽  
Amorphous Carbon ◽  
Beam Energy ◽  
Ion Beam ◽  
Carbon Films ◽  
Amorphous Carbon Films ◽  
Cu Alloy ◽  
Image Position

Abstract

Voids Investigation of Amorphous Carbon Films Deposited by DC-Magnetron Sputtering: A Small Angle x-ray Scattering and Gas Thermal Effusion Study

1999 ◽  
Vol 593 ◽  
Author(s):  
F.L. Freire ◽  
L.G. Jacobsohn ◽  
D.F. Franceschini ◽  
S.S. Camargo
Keyword(s):  
Magnetron Sputtering ◽  
Amorphous Carbon ◽  
Small Angle ◽  
Ion Beam ◽  
Carbon Films ◽  
Dc Magnetron Sputtering ◽  
Amorphous Carbon Films ◽  
X Ray ◽  
X Ray Scattering ◽  
Ray Scattering

ABSTRACTAmorphous carbon films were deposited onto (100) Si crystals and onto ultra-pure Al foils by dc-magnetron sputtering with different Ar plasma pressures, from 0.17 to 1.4 Pa. We investigate the voids structure and the voids density in these films by means of small angle x-ray scattering (SAXS) and mass spectrometry of effused gases. The analysis of the effusion spectra provided clear evidence that films deposited at lower pressures are compact, while the films deposited at higher pressure present a more open structural arrangement, confirming density results obtained by using ion beam techniques. SAXS results reveal that the fraction of open volumes increases with the plasma pressure: a direct correlation between film density and open volume fraction is found. These different film microstructures could be explained by the existence of different bombarding regimes during film growth

Optical and structural properties of nitrogen doped amorphous carbon films grown by rf plasma-enhanced CVD

2001 ◽  
Vol 10 (3-7) ◽  
pp. 1002-1006 ◽  
Author(s):  
Y. Hayashi ◽  
K.M. Krishna ◽  
H. Ebisu ◽  
T. Soga ◽  
M. Umeno ◽  
...  
Keyword(s):  
Structural Properties ◽  
Amorphous Carbon ◽  
Carbon Films ◽  
Rf Plasma ◽  
Amorphous Carbon Films ◽  
Nitrogen Doped ◽  
Plasma Enhanced Cvd

scholarly journals Structural properties of fluorinated amorphous carbon films

2000 ◽  
Vol 87 (1) ◽  
pp. 621-623 ◽  
Author(s):  
X. Wang ◽  
H. R. Harris ◽  
K. Bouldin ◽  
H. Temkin ◽  
S. Gangopadhyay ◽  
...  
Keyword(s):  
Structural Properties ◽  
Amorphous Carbon ◽  
Carbon Films ◽  
Amorphous Carbon Films

scholarly journals The Effect of Stress in the Density of States of Amorphous Carbon Films Determined by X-Ray Excited Auger Electron Spectroscopy

2017 ◽  
Vol 2017 ◽  
pp. 1-5 ◽  
Author(s):  
P. F. Barbieri ◽  
F. C. Marques
Keyword(s):  
Auger Electron Spectroscopy ◽  
Density Of States ◽  
Amorphous Carbon ◽  
Electron Spectroscopy ◽  
Auger Electron ◽  
Ion Beam ◽  
Carbon Films ◽  
Film Stress ◽  
Amorphous Carbon Films ◽  
X Ray

Amorphous carbon films can be prepared with a large variety of structure and have been used in a number of technological applications. Many of their properties have been determined, but very little is known concerning the effect of pressure on their properties. In this work we investigate the influence of pressure of graphite-like amorphous carbon films on the density of states (DOS) using X-ray Excited Auger Electron Spectroscopy (XAES) and the second derivate method of the XAES. The films were deposited by ion beam deposition and simultaneously bombarded with argon, which is responsible for the variation of the film stress, reaching extremely high values (4.5 GPa). Marked variations of the density of states of the pπ, pσ, sp, and s components were observed with increasing stress.

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