STUDY OF STRUCTURAL EVOLUTION OF AMORPHOUS CARBON FILMS ON Ni-Cu ALLOY AND ITS CORRELATION WITH DEPOSITION TEMPERATURE AND ION BEAM ENERGY

ABSTRACTAmorphous carbon films were deposited onto (100) Si crystals and onto ultra-pure Al foils by dc-magnetron sputtering with different Ar plasma pressures, from 0.17 to 1.4 Pa. We investigate the voids structure and the voids density in these films by means of small angle x-ray scattering (SAXS) and mass spectrometry of effused gases. The analysis of the effusion spectra provided clear evidence that films deposited at lower pressures are compact, while the films deposited at higher pressure present a more open structural arrangement, confirming density results obtained by using ion beam techniques. SAXS results reveal that the fraction of open volumes increases with the plasma pressure: a direct correlation between film density and open volume fraction is found. These different film microstructures could be explained by the existence of different bombarding regimes during film growth

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The Effect of Stress in the Density of States of Amorphous Carbon Films Determined by X-Ray Excited Auger Electron Spectroscopy

Advances in Materials Science and Engineering ◽

10.1155/2017/5826527 ◽

2017 ◽

Vol 2017 ◽

pp. 1-5 ◽

Cited By ~ 2

Author(s):

P. F. Barbieri ◽

F. C. Marques

Keyword(s):

Auger Electron Spectroscopy ◽

Density Of States ◽

Amorphous Carbon ◽

Electron Spectroscopy ◽

Auger Electron ◽

Ion Beam ◽

Carbon Films ◽

Film Stress ◽

Amorphous Carbon Films ◽

X Ray

Amorphous carbon films can be prepared with a large variety of structure and have been used in a number of technological applications. Many of their properties have been determined, but very little is known concerning the effect of pressure on their properties. In this work we investigate the influence of pressure of graphite-like amorphous carbon films on the density of states (DOS) using X-ray Excited Auger Electron Spectroscopy (XAES) and the second derivate method of the XAES. The films were deposited by ion beam deposition and simultaneously bombarded with argon, which is responsible for the variation of the film stress, reaching extremely high values (4.5 GPa). Marked variations of the density of states of the pπ, pσ, sp, and s components were observed with increasing stress.

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Phase transformation of hydrogen free amorphous carbon films under ion beam bombardment

Carbon ◽

10.1016/s0008-6223(98)00053-0 ◽

1998 ◽

Vol 36 (5-6) ◽

pp. 545-548 ◽

Cited By ~ 9

Author(s):

Ch.B. Lioutas ◽

N. Vouroutzis ◽

S. Logothetidis ◽

S. Boultadakis

Keyword(s):

Phase Transformation ◽

Amorphous Carbon ◽

Ion Beam ◽

Carbon Films ◽

Amorphous Carbon Films

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2541 Multi-Functionalization on polymeric materials through forming amorphous carbon films by Ion beam

The proceedings of the JSME annual meeting ◽

10.1299/jsmemecjo.2007.6.0_283 ◽

2007 ◽

Vol 2007.6 (0) ◽

pp. 283-284

Author(s):

Mutsumi KANEKO ◽

Takayoshi YAGASAKI ◽

Ichiro TAKANO ◽

Yuji KIMURA ◽

Takashi SHIMODA

Keyword(s):

Amorphous Carbon ◽

Ion Beam ◽

Polymeric Materials ◽

Carbon Films ◽

Amorphous Carbon Films

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Ion Beam Deposition of Amorphous Carbon Films With Diamond Like Properties

MRS Proceedings ◽

10.1557/proc-7-433 ◽

1981 ◽

Vol 7 ◽

Cited By ~ 3

Author(s):

John C. Angus ◽

Michael J. Mirtich ◽

Edwin G. Wintucky

Keyword(s):

Amorphous Carbon ◽

Growth Rates ◽

Random Network ◽

Ion Beam ◽

Potassium Bromide ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Ion Beam Deposition ◽

Beam Deposition

ABSTRACTCarbon films were deposited on silicon, quartz, and potassium bromide substrates from an ion beam. Growth rates were approximately 0.3 μm/hour. The films were featureless and amorphous and contained only carbon and hydrogen in significant amounts. The density and carbon/hydrogen ratio indicate the film is a hydrogen deficient polymer. One possible structure, consistent with the data, is a random network of methylene linkages and tetrahedrally coordinated carbon atoms.

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Elastic Properties of Diamond-Like Amorphous Carbon Films Grown by Computer Simulation of Ion-Beam Deposition Process

MRS Proceedings ◽

10.1557/proc-648-p6.53 ◽

2000 ◽

Vol 648 ◽

Cited By ~ 1

Author(s):

A.Yu. Belov ◽

H.U. Jäger

Keyword(s):

Amorphous Carbon ◽

Elastic Constants ◽

Ion Beam ◽

Carbon Films ◽

Atomic Scale ◽

Ion Energy ◽

Amorphous Carbon Films ◽

Ion Beam Deposition ◽

Bulk Stress ◽

Beam Deposition

AbstractAtomic-scale calculations were performed for the first time to investigate mechanical properties of amorphous carbon films grown by a realistic simulation of ion-beam deposition. The simulated films have a thickness of a few nanometers and reproduce the main structural features of real films, with the bulk content of sp3 bonded atoms varying from 35 to 95%, depending on the ion energy (E = 20-80 eV). Employing empirical interatomic potentials for carbon, the average bulk stresses as well as the atomic-level stress distributions were calculated and analysed. The bulk stresses were found to depend not only on the ion energy, but also on the film quality, in particular, on such structural inhomogeneities as local fluctuations of the sp3 fraction with the depth. The local variation of the bulk stress from the average value considerably increases as the local content of sp2 bonded atoms increases. Elastic constants of amorphous carbon films were also computed using the method of inner elastic constants, which allows for the stress dependence of elastic constants to be analysed. The variation of Young's modulus as a function of the lateral bulk stress in an amorphous film is demonstrated.

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