scholarly journals Structural Defects in Laterally Overgrown GaN Layers Grown on Non-polar Substrates

2006 ◽  
Vol 955 ◽  
Author(s):  
Zuzanna Liliental-Weber ◽  
X. Ni ◽  
H. Morkoc
Keyword(s):  
Large Angle ◽  
Stacking Faults ◽  
Growth Direction ◽  
Convergent Beam Electron Diffraction ◽  
Structural Defects ◽  
Threading Dislocations ◽  
Beam Electron ◽  
Transmission Electron ◽  
Wing Width ◽  
Convergent Beam

ABSTRACTTransmission electron microscopy was used to study defects in lateral epitaxial layers of GaN which were overgrown on a template of a-plane (1120) GaN grown on (1102) r-plane Al2O3. A high density of basal stacking faults is formed in these layers because the c-planes of wurtzite structure are arranged along the growth direction. Density of these faults is decreasing at least by two orders of magnitude lower in the wings compared to the seed areas. Prismatic stacking faults and threading dislocations are also observed, but their densities drastically decrease in the wings. The wings grow with opposite polarities and the Ga-wing width is at least 6 times larger than N-wing and coalescence is rather difficult. Some tilt and twist was detected using Large Angle Convergent Beam Electron Diffraction.

scholarly journals Can Laterally Overgrown GaN Layers be free of Structural Defects?

2000 ◽  
Vol 639 ◽  
Author(s):  
D. Cherns ◽  
Z. Liliental-Weber
Keyword(s):  
Large Angle ◽  
Convergent Beam Electron Diffraction ◽  
Structural Defects ◽  
Shear Stresses ◽  
Threading Dislocations ◽  
Cross Sectional ◽  
Plan View ◽  
Transmission Electron ◽  
Half Loop ◽  
Convergent Beam

ABSTRACTTransmission electron microscopy has been used to examine dislocations present in an epitaxial laterally overgrown (ELOG) sample of GaN grown on (0001)sapphire. Studies of both plan-view and cross-sectional samples revealed arrays of dislocations present in the (11-20) boundary between the seed and the wing (overgrown) material and at the meeting front between adjacent wings, as well as dislocations in the form of half-loops extending into the wing regions. Both the boundary and half-loop dislocations had 1/3<11-20> Burgers vectors which were either perpendicular (boundary dislocations) or at 30°s (half-loops) to the boundary plane. Large angle convergent beam electron diffraction was used to show that the boundary dislocations and halfloops correlated respectively with tilts and twists of the wing material about (11-20). A model is proposed whereby the half-loops are generated from threading dislocations by shear stresses acting along the stripe direction. The origin, and elimination, of these stresses is discussed.

scholarly journals Dislocation Analysis in SiGe Heterostructures by Large-Angle Convergent Beam Electron Diffraction

Crystals ◽  
2019 ◽  
Vol 10 (1) ◽  
pp. 5
Author(s):  
Heiko Groiss
Keyword(s):  
Electron Microscopy ◽  
Electron Diffraction ◽  
Strain Relaxation ◽  
Large Angle ◽  
Convergent Beam Electron Diffraction ◽  
Self Organization ◽  
Detailed Knowledge ◽  
Beam Electron ◽  
Transmission Electron ◽  
Convergent Beam

Dislocations play a crucial role in self-organization and strain relaxation mechanisms in SiGe heterostructures. In most cases, they should be avoided, and different strategies exist to exploit their nucleation properties in order to manipulate their position. In either case, detailed knowledge about their exact Burgers vectors and possible dislocation reactions are necessary to optimize the fabrication processes and the properties of SiGe materials. In this review a brief overview of the dislocation mechanisms in the SiGe system is given. The method of choice for dislocation characterization is transmission electron microscopy. In particular, the article provides a detailed introduction into large-angle convergent-beam electron diffraction, and gives an overview of different application examples of this method on SiGe structures and related systems.

The Art and Application of Large Angle Convergent Beam Electron Diffraction

2012 ◽  
Vol 186 ◽  
pp. 16-19 ◽  
Author(s):  
Elżbieta Jezierska
Keyword(s):  
Electron Diffraction ◽  
Large Angle ◽  
Antiphase Boundary ◽  
Antiphase Domain ◽  
Dark Field ◽  
Convergent Beam Electron Diffraction ◽  
Intermetallic Alloys ◽  
Beam Electron ◽  
Transmission Electron ◽  
Convergent Beam

The antiphase domain structure in Ni3Al and Al3Ti+Cu intermetallic alloys was recognized by conventional transmission electron microscopy and large angle convergent beam electron diffraction methods. In the case of antiphase boundary the superlattice excess line is split into two lines with equal intensity on bright and dark field LACBED pattern. This splitting can be considered as typical and used to identify APBs. The recognition between perfect structure of the defect-free matrix and the screw deviation around the nanopipes in GaN epilayers was performed with high accuracy using Zone Axis LACBED images.

Anaysis of Lacbed Patterns from A Microtwin in Cobalt

2001 ◽  
Vol 7 (S2) ◽  
pp. 266-267
Author(s):  
Hwang Su Kim ◽  
Byung Ryang Ahn
Keyword(s):  
Electron Diffraction ◽  
Large Angle ◽  
Stacking Faults ◽  
Dark Field ◽  
Convergent Beam Electron Diffraction ◽  
Bright Field ◽  
Beam Electron ◽  
Thin Foils ◽  
Specimen Height ◽  
Convergent Beam

Recently LACBED (Large Angle Convergent Beam Electron Diffraction) studies for identifying the nature of stacking faults has been reported in [1,2]. Here we report the LACBED study for a microtwin whose images are usually similar to those of an intrinsic or an extrinsic stacking faults (for this discussion, see [3]).Observations: Thin foils of cobalt with the thickness of about 180 nm (f.c.c phase, a=0.354 nm) were examined by a Philips CM200. Fig. 1 shows strong beam dark field images of microtwins or stacking faults. Fig. 2 shows the bright field LACBED pattern taken near the area marked as a circle in fig. 1. The specimen height, from the convergent point of beams, was about 0.0586 mm and the convergent angle was 0.615 degrees.Calculations and analysis: Analysis of fig. 1 alone indicates the encircled fault an extrinsic stacking fault.

Chemical sensitivity of convergent beam electron diffraction on the stoichiometry of GaN

1995 ◽  
Vol 53 ◽  
pp. 148-149
Author(s):  
Zuzanna Liliental-Weber ◽  
Christian Kisielowski ◽  
Jack Washburn
Keyword(s):  
Electron Diffraction ◽  
Film Growth ◽  
Lattice Mismatch ◽  
Uv Light ◽  
Convergent Beam Electron Diffraction ◽  
Structural Defects ◽  
Plan View ◽  
Beam Electron ◽  
Transmission Electron ◽  
Convergent Beam

III-V nitride thin film growth has attracted considerable attention because it now seems feasible to engineer semiconductor band gaps between 2.1 and 6.2 eV. One of the challenges coming with this development is related to the fact that structural perfection seems not to correlate directly with optical properties such as the emission of blue-green or UV light in GaN. In order to better understand this material High Resolution Transmission Electron Microscopy (HREM) and Convergent Beam Electron Diffraction (CBED) experiments were used to study structural defects in GaN thin films. Experiments were performed with a Topcon 002B and ARM operating at 200 and 800 KeV, respectively, and were guided by image simulations. Results of parallel luminescence studies will be published elsewhere.Plan-view micrographs of GaN grown on the (0001) basal plane of A12O3 with a lattice mismatch of 14% show small angle grain boundaries which divide the layer into large subgrains of about 800 nm diameter. Other defects visible in the plan-view micrographs are threading dislocations and planar defects lying parallel to the {1010} planes of the GaN.

A library of convergent-beam electron diffraction patterns

1986 ◽  
Vol 44 ◽  
pp. 688-691
Author(s):  
John F. Mansfield
Keyword(s):  
Electron Diffraction ◽  
Materials Science ◽  
Convergent Beam Electron Diffraction ◽  
Beam Electron ◽  
Transmission Electron ◽  
Yield Information ◽  
Analytical Electron ◽  
Diffraction Patterns ◽  
Convergent Beam ◽  
Electron Energy Loss

One of the most important advancements of the transmission electron microscopy (TEM) in recent years has been the development of the analytical electron microscope (AEM). The microanalytical capabilities of AEMs are based on the three major techniques that have been refined in the last decade or so, namely, Convergent Beam Electron Diffraction (CBED), X-ray Energy Dispersive Spectroscopy (XEDS) and Electron Energy Loss Spectroscopy (EELS). Each of these techniques can yield information on the specimen under study that is not obtainable by any other means. However, it is when they are used in concert that they are most powerful. The application of CBED in materials science is not restricted to microanalysis. However, this is the area where it is most frequently employed. It is used specifically to the identification of the lattice-type, point and space group of phases present within a sample. The addition of chemical/elemental information from XEDS or EELS spectra to the diffraction data usually allows unique identification of a phase.

Convergent-beam electron diffraction at high spatial resolution

1992 ◽  
Vol 50 (2) ◽  
pp. 1152-1153 ◽  
Author(s):  
J W Steeds
Keyword(s):  
Electron Diffraction ◽  
High Temperature Superconductors ◽  
Bloch Wave ◽  
Convergent Beam Electron Diffraction ◽  
Beam Electron ◽  
Energy Filtering ◽  
Small Probe ◽  
Transmission Electron ◽  
Electron Microscopes ◽  
Convergent Beam

That the techniques of convergent beam electron diffraction (CBED) are now widely practised is evident, both from the way in which they feature in the sale of new transmission electron microscopes (TEMs) and from the frequency with which the results appear in the literature: new phases of high temperature superconductors is a case in point. The arrival of a new generation of TEMs operating with coherent sources at 200-300kV opens up a number of new possibilities.First, there is the possibility of quantitative work of very high accuracy. The small probe will essentially eliminate thickness or orientation averaging and this, together with efficient energy filtering by a doubly-dispersive electron energy loss spectrometer, will yield results of unsurpassed quality. The Bloch wave formulation of electron diffraction has proved itself an effective and efficient method of interpreting the data. The treatment of absorption in these calculations has recently been improved with the result that <100> HOLZ polarity determinations can now be performed on III-V and II-VI semiconductors.

Large-angle convergent-beam electron-diffraction study of coherent precipitates and decorated dislocations

1996 ◽  
Vol 54 ◽  
pp. 1002-1004
Author(s):  
J.M.K. Wiezorek ◽  
H.L. Fraser
Keyword(s):  
Electron Diffraction ◽  
Angular Resolution ◽  
Large Angle ◽  
Electron Diffraction Study ◽  
Convergent Beam Electron Diffraction ◽  
Crystal Defects ◽  
High Angular Resolution ◽  
Beam Electron ◽  
Diffraction Plane ◽  
Convergent Beam

Conventional methods of convergent beam electron diffraction (CBED) use a fully converged probe focused on the specimen in the object plane resulting in the formation of a CBED pattern in the diffraction plane. Large angle CBED (LACBED) uses a converged but defocused probe resulting in the formation of ‘shadow images’ of the illuminated sample area in the diffraction plane. Hence, low-spatial resolution image information and high-angular resolution diffraction information are superimposed in LACBED patterns which enables the simultaneous observation of crystal defects and their effect on the diffraction pattern. In recent years LACBED has been used successfully for the investigation of a variety of crystal defects, such as stacking faults, interfaces and dislocations. In this paper the contrast from coherent precipitates and decorated dislocations in LACBED patterns has been investigated. Computer simulated LACBED contrast from decorated dislocations and coherent precipitates is compared with experimental observations.

Sign in / Sign up

Export Citation Format

Share Document