Liquid Phase Growth of Epitaxial Ni and Co Silicides by Pulsed Laser Irradiation
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ABSTRACTEpitaxial Ni and Co silicides have been fabricated using pulsed laser melting. Interfacial instabilities and cell formation are suppressed during the liquid-phase epitaxy by melting mono or disilicide layers. Single crystal NiSi2 and CoSi2 films have been grown on (100) and (111) Si following a post-anneal. This method does not require UHV deposition or reaction techniques.
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1993 ◽
Vol 51
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pp. 438-439
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2013 ◽
Vol 380
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pp. 18-22
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2014 ◽
Vol 44
(6)
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pp. 1870-1875
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2003 ◽
Vol 42
(Part 2, No.1A/B)
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pp. L4-L6
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