Characterisation of Interfaces in SiGe Superlatrlces by Combined Grazing Incidence X-Ray Fluorescence and Reflectivity

1991 ◽  
Vol 238 ◽  
Author(s):  
Adrian R. Powell ◽  
Jaroslav Bradler ◽  
Charles R. Thomas ◽  
Richard A. Kubiak ◽  
D. Keith Bowen ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Silicon Germanium ◽  
Critical Angle ◽  
Grazing Angle ◽  
Single Layer ◽  
High Sensitivity ◽  
Grazing Incidence ◽  
Total Reflection ◽  
X Ray

ABSTRACTX-Ray reflectivity enables the determination of interface and surface roughness along with the variations present in the electron density. Total reflection X-ray fluorescence allows surface analysis with high sensitivity and quantification. By use of grazing angle x-ray fluorescence taken simultaneously with the reflectivity measurements, over a range of angles near the critical angle, it is possible in principle to produce a depth profile of each element, with a composition sensitivity of 0.0002%. A silicon-germanium single layer was used to calibrate the instrument and a Si-Ge 5- period superlattice for a demonstration measurement.

scholarly journals Multiple scattering in grazing-incidence X-ray diffraction: impact on lattice-constant determination in thin films

2016 ◽  
Vol 23 (3) ◽  
pp. 729-734 ◽  
Author(s):  
Roland Resel ◽  
Markus Bainschab ◽  
Alexander Pichler ◽  
Theo Dingemans ◽  
Clemens Simbrunner ◽  
...  
Keyword(s):  
Thin Films ◽  
Critical Angle ◽  
Grazing Incidence ◽  
X Rays ◽  
Organic Thin Film ◽  
X Ray Diffraction ◽  
Reliable Determination ◽  
X Ray ◽  
Out Of Plane

Dynamical scattering effects are observed in grazing-incidence X-ray diffraction experiments using an organic thin film of 2,2′:6′,2′′-ternaphthalene grown on oxidized silicon as substrate. Here, a splitting of all Bragg peaks in the out-of-plane direction (z-direction) has been observed, the magnitude of which depends both on the incidence angle of the primary beam and the out-of-plane angle of the scattered beam. The incident angle was varied between 0.09° and 0.25° for synchrotron radiation of 10.5 keV. This study reveals comparable intensities of the split peaks with a maximum for incidence angles close to the critical angle of total external reflection of the substrate. This observation is rationalized by two different scattering pathways resulting in diffraction peaks at different positions at the detector. In order to minimize the splitting, the data suggest either using incident angles well below the critical angle of total reflection or angles well above, which sufficiently attenuates the contributions from the second scattering path. This study highlights that the refraction of X-rays in (organic) thin films has to be corrected accordingly to allow for the determination of peak positions with sufficient accuracy. Based thereon, a reliable determination of the lattice constants becomes feasible, which is required for crystallographic structure solutions from thin films.

Analysis of Specific Interfaces in Thin Films by X-Ray Fluorescence Using Interference Effect in Total Reflection

1995 ◽  
Vol 39 ◽  
pp. 695-700
Author(s):  
Kenji Sakurai ◽  
Atsuo Iida
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Standing Wave ◽  
Interference Effect ◽  
High Sensitivity ◽  
Grazing Incidence ◽  
Analytical Tool ◽  
Total Reflection ◽  
X Ray ◽  
Detailed Interpretation

It has been proposed that the interference effect in grazing incidence/exit X-ray fluorescence can be used as an analytical tool. Though these total reflection related measurements have been widely used because of their inherent high sensitivity to the surface of materials, the interference in case of thin films is most likely to be considered difficult to analyze. The present paper describes the use of the interference effect to provide additional capability to enhance information on a specific interface of a thin film. Detailed interpretation of the angular resolved fluorescence tells us at which interface an element of interest is localized. It can be applied to the thin film of only a few layers or non-periodic multilayers where a regular standing wave is not generated.

Determination of Heavy Metals in Environmental Water by Total Reflection X-Ray Fluorescence Method using Optimized Roentgen Optics Cut-Off Filter

1991 ◽  
Vol 35 (B) ◽  
pp. 959-963 ◽  
Author(s):  
A. I. Egorov ◽  
L. P. Kablna ◽  
I. A. Kondurov ◽  
E. M. Korotkikh ◽  
V. V. Martynov ◽  
...  
Keyword(s):  
Heavy Metals ◽  
Critical Angle ◽  
Environmental Water ◽  
Total Reflection ◽  
Angular Deviation ◽  
Narrow Beam ◽  
X Ray ◽  
Order Of Magnitude ◽  
Elemental Contents

The total reflection x-ray fluorescence (TXRF) method of analyzing elemental contents Is based on the small angle irradiation of thin samples placed on a total reflecting backing with a narrow photon beam. Two instrumental problems are to be solved here. The first is to form the narrow beam with a small angular deviation. The usual way to solve this problem is to use collimators with small solid angles. These angles must be less than the critical angle for x-ray total reflection, which, in the energy range 10 - 20 keV has an order of magnitude around 10−3 rad.

Determination of some heavy metals (Fe, Cu, Zn and Pb) in blood by total reflection X-ray fluorescence

2003 ◽  
Vol 107 ◽  
pp. 203-206 ◽  
Author(s):  
M. Bounakhla ◽  
A. Doukkali ◽  
K. Lalaoui ◽  
H. Aguenaou ◽  
N. Mokhtar ◽  
...  
Keyword(s):  
Heavy Metals ◽  
Total Reflection ◽  
X Ray

Structure determination of ultrathin NbSe2 films by Grazing incidence x-ray diffraction

1994 ◽  
Vol 89 (7) ◽  
pp. 583-586 ◽  
Author(s):  
Toshihiro Shimada ◽  
Yukito Furukawa ◽  
Etsuo Arakawa ◽  
Kunikazu Takeshita ◽  
Tadashi Matsushita ◽  
...  
Keyword(s):  
Structure Determination ◽  
Grazing Incidence ◽  
X Ray Diffraction ◽  
X Ray

Bulk determination of uranium and thorium in presence of each other by Total Reflection X-ray Fluorescence spectrometry

2007 ◽  
Vol 62 (1) ◽  
pp. 82-85 ◽  
Author(s):  
Sangita Dhara ◽  
Nand Lal Misra ◽  
Khush Dev Singh Mudher ◽  
Suresh Kumar Aggarwal
Keyword(s):  
Total Reflection ◽  
Fluorescence Spectrometry ◽  
X Ray

Strain, Stress, and Magnetic Surfaceanisotropy of Epitaxial FE(110)/MO (110) Multilayers

1993 ◽  
Vol 317 ◽  
Author(s):  
R.M. Osgood ◽  
B.M. Clemens ◽  
R.L. White ◽  
S. Brennan
Keyword(s):  
Strain State ◽  
Single Layer ◽  
Grazing Incidence ◽  
Magnetic Surface ◽  
Stress And Strain ◽  
Surface Anisotropy ◽  
X Ray Diffraction ◽  
X Ray ◽  
Plane Direction ◽  
Strain Stress

ABSTRACTGrazing incidence and asymmetric X-ray diffraction were used to measure the stress and strain state of Fe(110)/Mo(110) Multilayers. The highest stress in the Fe constituent of the multilayer was along the [110] in-plane direction and was due to interaction with the substrate. The Magnetic anisotropy of the Fe Multilayer constituent was measured and the magnetic surface anisotropy, which favored in-plane [001] magnetization, was deduced. In contrast, the magnetic surface anisotropy of a single layer of Fe on W preferred in-plane [110] magnetization, in agreement with the Néel Model.

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