CVD Precursors Containing Hydropyridine Ligands
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AbstractHydropyridine is introduced as a new ligand for use in constructing precursors for chemical vapor deposition. Detachment of hydropyridine occurs by a low-temperature reaction leaving hydrogen in place of the hydropyridine, and a very stable byproduct, pyridine vapor. Hydropyridine ligands can be attached to a variety of elements, including main group metals, such as aluminum and antimony, transition metals, such as titanium and tantalum, semiconductors such as silicon, and nonmetals such as phosphorus and arsenic.
High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes
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2006 ◽
Vol 10
(3)
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pp. 457-466
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2002 ◽
Vol 361
(3-4)
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pp. 189-195
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1995 ◽
Vol 13
(3)
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pp. 1619-1623
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