Adhesion Evaluation of CVD Diamond Films and Metal Reinforced Composite Diamond Films

1995 ◽  
Vol 383 ◽  
Author(s):  
D. F. Bahr ◽  
J..C. Nelson ◽  
D. Zhuang ◽  
E. Pfender ◽  
J. Heberlein ◽  
...  

ABSTRACTPoor adhesion of diamond films limits the use of CVD diamond films as coatings for cutting tools. The adhesion of these films is limited by stresses in the film caused by thermal expansion mismatch between the substrate and the film and by voids present at the interface due to the morphology of the crystal growth. A three step process of making diamond composite films has been developed, involving nucleation of individual diamonds on the substrate, electroplating a metal binder in the voids between the crystals, and lastly growing a complete film over the composite layer. The metal binder acts both to fill the voids at the interface and to absorb energy during fracture processes at the interface. Diamond growth was performed in a DC Triple Torch reactor using a mixture of methane and hydrogen with a molybdenum substrate. Measurements to determine the amount of improvement of the film adhesion have been performed. These tests include indentations using conventional hardness testing equipment and four point bend tests with the film in tension and compression. A correlation is shown between the plastic zone of the substrate and the area of the film which delaminated during indentation. Bend tests with the film in tension did not delaminate the film, instead the film underwent intergranular fracture. Bend tests in compression act similarly to pile up around an indentation, and cause film delamination. Residual stress measurements in the single step film show a compressive stress of 650 MPa.

2015 ◽  
Vol 1728 ◽  
Author(s):  
Stefano Gay ◽  
Giacomo Reina ◽  
Ilaria Cianchetta ◽  
Emanuela Tamburri ◽  
Mariglen Angjellari ◽  
...  

ABSTRACTWe report here on the chemical methodologies that are being settled in our labs for the insertion in diamond of foreign atoms and consequent creation of fluorescent defects. The inclusion of Si, Cr, Ge, able to produce color centers, is directly obtained during the process of diamond synthesis by means of a CVD technique. The deposition of the diamond films takes place on substrates of different nature, treated following procedures specifically settled to control the insertion of the different species. The photoluminescence emission from a series of diamond samples grown on different substrates (Si, Ge and Ti) has been investigated and is discussed with reference to the morphological/structural features of the diamond phase and to the experimental procedures adopted for substrate preparation.


2012 ◽  
Vol 727-728 ◽  
pp. 1433-1438 ◽  
Author(s):  
R.A. Campos ◽  
A. Contin ◽  
Vladimir J. Trava-Airoldi ◽  
J.R. Moro ◽  
D.M. Barquete ◽  
...  

Silicon Nitride is largely used as the base material to manufacture cutting tools. Due to its low thermal expansion coefficient it is ideal candidate for CVD diamond deposition. In this work, we functionalized the surface of silicon nitride inserts (Si3N4) with a polymer (PDDA Poly (diallyldimethylamonium chloride - Mw 40000)) to promote seeding with nanodiamond particles. The seeding was performed in water slurry containing 4 nm diamond particles dispersed by PSS Poly (sodium4-styrenesulfonate) polymer. CVD diamond films, with high nucleation density, were deposited in a hot filament reactor. Film morphology was characterized by Atomic Force Microscopy (AFM) and Scanning Electron Microscopy (SEM). Diamond film quality was determined by Raman Spectroscopy. CVD diamond film adherence was evaluated using Rockwell C indentation.


1996 ◽  
Vol 436 ◽  
Author(s):  
M. D. Drory

AbstractLarge residual stresses in diamond coatings may result in film failure through splitting, delamination and substrate failure. In addition, the CVD diamond growth environment may degrade the substrate mechanical properties. These issues are examined for diamond-coating of a tool steel alloy. Diamond growth was achieved on the steel substrate with the use of a titanium interlayer. Embrittlement of the Ti interlayer was not evident, however the substrate hardness was severely degraded.


Author(s):  
Dmitry V. Teteruk ◽  
Vitaly S. Bormashov ◽  
Sergey A. Tarelkin ◽  
Nikolay V. Kornilov ◽  
Nikolay V. Luparev ◽  
...  

CVD diamond grows on the all surfaces of the substrate, including the side faces. However, the diamond layer on side faces may be undesirable. We proposed and developed the method to suppress the CVD diamond growth on the side faces using silicon wells. The optimal geometric dimensions of the wells were determined. The studies of the structural quality of the CVD diamond films were carried out.


2005 ◽  
Vol 12 (04) ◽  
pp. 499-504
Author(s):  
SHA LIU ◽  
ZHI-MING YU ◽  
DAN-QING YI

It is known that in the condition of chemical vapor deposition (CVD) diamond process, molybdenum is capable of forming carbide known as the "glue" which promotes growth of the CVD diamond, and aids its adhesion by (partial) relief of stresses at the interface. Furthermore, the WC grains are reaction bonded to the Mo 2 C phase. Therefore, molybdenum is a good candidate material for the intermediate layer between WC–Co substrates and diamond coatings. A molybdenum intermediate layer of 1–3 μm thickness was magnetron sputter-deposited on WC/Co alloy prior to the deposition of diamond coatings. Diamond films were deposited by hot filament chemical vapor deposition (HFCVD). The chemical quality, morphology, and crystal structure of the molybdenum intermediate layer and the diamond coatings were characterized by means of SEM, EDX, XRD and Raman spectroscopy. It was found that the continuous Mo intermediate layer emerged in spherical shapes and had grain sizes of 0.5–1.5 μm after 30 min sputter deposition. The diamond grain growth rate was slightly slower as compared with that of uncoated Mo layer on the WC–Co substrate. The morphologies of the diamond films on the WC–Co substrate varied with the amount of Mo and Co on the substrate. The Mo intermediate layer was effective to act as a buffer layer for both Co diffusion and diamond growth.


1998 ◽  
Vol 7 (2-5) ◽  
pp. 589-596 ◽  
Author(s):  
D. Schneider ◽  
B. Schultrich ◽  
P. Burck ◽  
H.-J. Scheibe ◽  
G. Jörgensen ◽  
...  

1995 ◽  
Vol 383 ◽  
Author(s):  
J. W. Hoehn ◽  
D. F. Bahr ◽  
J. Heberlein ◽  
E. Pfender ◽  
W. W. Gerberich

ABSTRACTComparison of behavior observed during deadhesion of CVD diamond films and compositional analysis of their microstructure allows a correlation between microstructure and mechanical behavior to be made. Diamond films were grown in a DC Triple Torch Reactor using a mixture of methane and hydrogen on molybdenum substrates. To address the issue of voids at the interface, a metal binder was electroplated after the nucleation of individual diamond crystals on the substrates. The films were completed by growing a layer of diamond upon the composite layer. Interfacial composition and structure of the films are characterized by a x-ray, Auger, and Raman spectroscopy. A carbide may act to enhance the adhesion via chemical bonding between the substrate and film. Diffusion of the binder into the substrate and film is also important for mechanical properties and is confirmed by x-ray mapping. It is suggested that a diamond like carbon layer acts to enhance the adhesion of the film to the substrate.


2015 ◽  
Vol 730 ◽  
pp. 160-163
Author(s):  
Li Zhu Zhang ◽  
Fu Zhong Wang ◽  
Guang Tian

In order to describe the morphology of diamond films, we have developed a geometrical growth model which takes into account the displacement of the observed faces [1].We will see how to establish the topologies that are potentially accessible to CVD diamond growth.Lastly, we will present results showing the influence of the occurrence of certain crystalline faces on the film characteristics. From these results, we will show how the growth model and to establish a growth strategy aimed at obtaining large usable surface area crystals.


2004 ◽  
Vol 449-452 ◽  
pp. 461-464
Author(s):  
Yoshihiko Murakami ◽  
H. Liu ◽  
H. Hanyu

We would like to report on the development of our new ultra fine crystalline CVD diamond film and some applications. CVD Diamond films have good wear resistance, but the crystal size is too large. Therefore, in case of application of diamond films for cutting tools, we cannot get fine surface finish on work materials. Recently we succeed in production ultra fine crystalline CVD diamond film and various cutting tools as taps, drills and end mills. Aluminum alloys have lately been consumed more than ever in airplanes and automobiles for the purpose of decreasing the weight of structural materials.Copper alloys are used for the electrode of electric discharge machines (EDM) recently. EDM electrodes are required fine surface finish because the surface quality of mold depends on accuracy of EDM electrodes. Soft materials such as aluminum and copper alloys have high viscosity and additionally activity. So during cutting aluminum and copper alloys we have sometimes adhesion between cutting tools and work pieces. Diamond film on tools is able to improve the reactivity to aluminum and copper alloys. But up to now the diamond film has a lot of course crystal and tend to supply rough surface finish on work pieces. We developed ultra fine crystalline diamond film on end mills by plasma chemical vapor deposition (CVD) method. Now our aircraft, automotive and molding customers can get smooth surface finish of work pieces.Keeping ISO14001, we recommend oil free cutting with ultra fine crystalline diamond coated cutting tools. Here I introduce background of the development and cutting examples with new fine diamond coated end mills.


1996 ◽  
Vol 154 (1) ◽  
pp. 403-422 ◽  
Author(s):  
F. Deuerler ◽  
M. Pies ◽  
H. van den Berg ◽  
R. Tabersky ◽  
V. Buck

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