Highly Conductive and Wide Band GaP Microcrystalline Silicon Films Prepared by Photochemical Vapor Deposition and Applications to Devices

1985 ◽  
Vol 49 ◽  
Author(s):  
S. Nishida ◽  
H. Tasaki ◽  
M. Konagai ◽  
K. Takahashi

AbstractDoped hydrogenated microcrystalline silicon (μc-Si:H) and fluorinated hydrogenated microcrystalline (μc-Si:F:H) films were prepared by the mercury photosensitized decomposition of a disilane-hydrogen or a difluorosilane-hydrogen gas mixture, respectively. The maximum dark conductivity and optical band gap of μc-Si:H films were respectively 20 S•cm−1 and ∼2.0 eV for n-type and 1 S•cm−1 and 2.3 eV for p-type. A higher dark conductivity as much as 50 S•cm−1 and a wide gap of 2.0 eV were obtained for n-type μc-Si:F:H. It is most significant that the gaseous ratio of hydrogen to disilane should be enhanced to obtain such a highly conductive and wide gap film. The crystallinity of the photo-deposited μc-Si:H films appeared to be improved in comparison with that of films by the conventional plasma glow discharge technique.

2011 ◽  
Vol 5 (4) ◽  
pp. 153-155 ◽  
Author(s):  
Seiji Yamazoe ◽  
Shunsuke Yanagimoto ◽  
Takahiro Wada
Keyword(s):  
Band Gap ◽  

2009 ◽  
Vol 95 (17) ◽  
pp. 172109 ◽  
Author(s):  
Anderson Janotti ◽  
Eric Snow ◽  
Chris G. Van de Walle

2009 ◽  
Vol 94 (20) ◽  
pp. 202103 ◽  
Author(s):  
Min-Ling Liu ◽  
Fu-Qiang Huang ◽  
Li-Dong Chen ◽  
I-Wei Chen

Author(s):  
V.A. Dmitriev

Wide band gap nitrides(InN, GaN, AlN) have been considered promising optoelectronics materials for many years [1]. Recently two main technological problems in the nitrides were overcome: (1)high quality layers has been grown on both sapphire and SiC substrates and(2) p-type GaN and AlGaN material has been obtained. These achievements resulted in the fabrication of bright light emitters in the violet, blue and green spectral regions [2].First injection laser has been demonstrated [3]. This paper reviews results obtained over the last few years on nitride p-n junctions, particularly on GaN based p-n junctions grown on SiC substrates. We will consider GaN p-n junctions, AlGaN p-n junctions, GaN and AlGaN p-i-n structures, and, finally, GaN/SiC p-n structures.


2013 ◽  
Vol 92 ◽  
pp. 198-201 ◽  
Author(s):  
S. Santra ◽  
N.S. Das ◽  
K.K. Chattopadhyay

2018 ◽  
Vol 57 (19) ◽  
pp. 11874-11883 ◽  
Author(s):  
Christos A. Tzitzeklis ◽  
Jyoti K. Gupta ◽  
Matthew S. Dyer ◽  
Troy D. Manning ◽  
Michael J. Pitcher ◽  
...  

2015 ◽  
Vol 54 (8S1) ◽  
pp. 08KC07 ◽  
Author(s):  
Hiroshi Sakakima ◽  
Mikihiko Nishitani ◽  
Koichi Yamamoto ◽  
Takahiro Wada

2003 ◽  
Vol 82 (17) ◽  
pp. 2814-2816 ◽  
Author(s):  
Hiroshi Yanagi ◽  
Janet Tate ◽  
Sangmoon Park ◽  
Cheol-Hee Park ◽  
Douglas A. Keszler

2009 ◽  
Vol 10 (5) ◽  
pp. 932-938 ◽  
Author(s):  
Michael Kröger ◽  
Sami Hamwi ◽  
Jens Meyer ◽  
Thomas Riedl ◽  
Wolfgang Kowalsky ◽  
...  

2012 ◽  
Vol 51 ◽  
pp. 10NC40 ◽  
Author(s):  
Seiji Yamazoe ◽  
Munehiro Yoshikawa ◽  
Takahiro Wada

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