Vibrational Properties of a-Si:H Films Containing Voids: Experiment and Modeling

1999 ◽  
Vol 557 ◽  
Author(s):  
N. Barriquand ◽  
V. Paillard ◽  
P. Roca i Cabarrocas ◽  
G. Landa ◽  
M. Djafari-Rouhani

AbstractIn this paper, we present results about the vibrational properties of hydrogenated amorphous silicon films. We expect to explain the slight differences observed in the Raman spectra using atomic-scale modeling. In particular, we focuse on the correlation of our results to the density of samples. This should give quantitative structural information which could be correlated to both macroscopic properties and elaboration conditions.

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