Wave Polymerization During Vapor Deposition of Porous Parylene-N Dielectric Films

1999 ◽  
Vol 565 ◽  
Author(s):  
James Erjavec ◽  
John Sikita ◽  
Stephen P. Beaudoin ◽  
Gregory B. Raupp

AbstractParylene-N films vapor deposited near liquid nitrogen temperature (77 K) undergo a unique ‘wave’ polymerization process in which a rapidly moving reaction front is apparent as the film changes from translucent to optically opaque. This moving reaction front produces a highly porous polymer film. The porosity of these films is approximately 80%. By capturing the wave process on video we have quantified the moving ‘wave’ velocity, which averages 11 cm/s. Timeaveraged deposition rates of the resulting opaque, porous films are more than 8 μm/min. This rate is more than two orders of magnitude greater than the measured deposition rates of nonporous films that are deposited at higher temperatures, at otherwise fixed conditions of monomer delivery rate and deposition chamber pressure.

2011 ◽  
Vol 2 (5) ◽  
pp. 1059 ◽  
Author(s):  
Harald Kirsebom ◽  
Bo Mattiasson

2019 ◽  
Vol 128 ◽  
pp. 105717 ◽  
Author(s):  
Mikhail N. Efimov ◽  
Elena Yu. Mironova ◽  
Andrey A. Vasilev ◽  
Dmitriy G. Muratov ◽  
Aleksey A. Averin ◽  
...  

Polymer ◽  
2019 ◽  
Vol 179 ◽  
pp. 121649 ◽  
Author(s):  
Xiu Yun Daphne Ma ◽  
Jia Ming Ang ◽  
Youfang Zhang ◽  
Zhihui Zeng ◽  
Chenyang Zhao ◽  
...  

1998 ◽  
Vol 13 (9) ◽  
pp. 2643-2648 ◽  
Author(s):  
R. A. Levy ◽  
V. B. Zaitsev ◽  
K. Aryusook ◽  
C. Ravindranath ◽  
V. Sigal ◽  
...  

In this study, trifluoroiodomethane (CF3I), a non-global-warming gas, has been investigated as a substitute for typical PFC's currently used in wafer patterning and CVD chamber cleaning processes. Dielectric films consisting of plasma enhanced chemically vapor deposited silicon dioxide and silicon nitride were comparatively etched in CF3I and C2F6/O2 plasma environments. The etch rate of these films was ascertained as a function of applied rf power, etchant gas flow rate, reaction chamber pressure, and CF3I: O2 ratio. Destruction efficiencies of CF3I at different processing parameters were evaluated. Depending on the flow rate, rf power, and chamber pressure, utilization efficiency of CF3I varied from as low as 10% to as high as 68%. CF4, C2F6, COF2, and CO2 were the predominant by-products found in the exhaust stream; however, their concentrations were very low compared to the traditional process employing C2F6/O2 mixtures.


2017 ◽  
Vol 56 (40) ◽  
pp. 11451-11459 ◽  
Author(s):  
Ehsan Rezabeigi ◽  
Robin A. L. Drew ◽  
Paula M. Wood-Adams

Materials ◽  
2018 ◽  
Vol 11 (12) ◽  
pp. 2359 ◽  
Author(s):  
Zbigniew Draczynski ◽  
Beata Kolesinska ◽  
Ilona Latanska ◽  
Witold Sujka

A method for obtaining highly porous materials in the form of film, based on the butyric-acetic chitin co-polyesters, containing 90% of butyryl and 10% of acetyl groups, was developed. The highly porous films, with thickness up to 0.11 mm, were obtained by two methods: (a) pouring 5% BAC 90/10 solution in ethanol on the layer of solid salts (porophor agent) which after solidification was eluted with water; (b) application of the suspension of porophor agent in BAC 90/10 solution in the solvent mixture with density similar to bulk porophor agent. In the final stage, the materials were obtained with porosity up to 95–99% and tensile strength 5 cN, which can be used as an active layer of medical dressings. The optimised procedure was used in the production of porous medical dressings (Medisorb) on an industrial scale. In the industrial method, NaCl was used as a porophor agent in the solid form and as a 3% solution in polymer. The final materials were characterised by porosity and other functional parameters at the level recommended for medical dressings. Medisorb series materials do not show in vitro cytotoxic activity.


RSC Advances ◽  
2014 ◽  
Vol 4 (98) ◽  
pp. 55604-55609 ◽  
Author(s):  
Ho Yeon Son ◽  
Dong Jae Lee ◽  
Jun Bae Lee ◽  
Chun Ho Park ◽  
Mintae Seo ◽  
...  

Organic–inorganic hybrid porous microparticles.


2013 ◽  
Vol 4 (5) ◽  
pp. 448-456 ◽  
Author(s):  
S. E. Bogorodskii ◽  
V. N. Vasilets ◽  
L. I. Krotova ◽  
S. A. Minaeva ◽  
A. V. Mironov ◽  
...  

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