Structure and Morphology Characters of GaN Grown by ECR-MBE Using Hydrogen-Nitrogen Mixed Gas Plasma

1999 ◽  
Vol 595 ◽  
Author(s):  
Tsutomu Araki ◽  
Yasuo Chiba ◽  
Yasushi Nanishi

AbstractGaN growth by electron-cyclotron-resonance plasma-excited molecular beam epitaxy using hydrogen-nitrogen mixed gas plasma were carried out on GaN templates with a different polar-surface. Structure and surface morphology of the GaN layers were characterized using transmission electron microscopy. The GaN layer grown with hydrogen on N-polar template showed a relatively flat morphology including hillocks. Columnar domain existed in the center of the hillock, which might be attributed to the existence of tiny inversion domain with Ga-polarity. On the other hand, columnarstructure was formed in the GaN layer grown with hydrogen on Ga-polar template.

1989 ◽  
Vol 162 ◽  
Author(s):  
Z. Sitar ◽  
M. J. Paisley ◽  
B. Yan ◽  
R. F. Davis

ABSTRACTSingle crystal cubic or hexagonal GaN thin films have been grown on various substrates, using a modified gas source MBE technique. A standard effusion cell was employed for the evaporation of gallium. A compact electron cyclotron resonance plasma source was used to activate the nitrogen prior to deposition. The films were examined by transmission electron microscopy. The major defects in the wurtzite GaN were double positioning boundaries, inversion domain boundaries, and dislocations. The zinc-blende GaN showed microtwins, stacking faults, and dislocations. The connection between the observed structural defects and the poor electrical properties of GaN is noted.


1995 ◽  
Vol 24 (9) ◽  
pp. 1201-1206 ◽  
Author(s):  
K. A. Harris ◽  
D. W. Endres ◽  
R. W. Yanka ◽  
L. M. Mohnkern ◽  
A. R. Reisinger ◽  
...  

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