Charge carrier transport in a-Si:H/c-Si heterojunctions

2001 ◽  
Vol 664 ◽  
Author(s):  
Susanne von Aichberger ◽  
Frank Wünsch ◽  
Marinus Kunst

ABSTRACTContactless transient photoconductivity measurements of a-Si:H / c-Si heterojunctions are presented. It is shown that n a-Si:H / n c-Si junctions furnish an excellent passivation of the n c-Si surface. For i a-Si:H / n c-Si junctions the passivation is better for thicker films, whereas for very thin films (10 nm or less) a deviating behaviour probably due to inhomogeneities is observed. For the p a-Si:H / n c-Si junction separation of excess charge carriers in the space charge region is observed leading to a slowly decaying tail of the signal. This separation is also observed in thick i a-Si:H / n c-Si samples where electrons are injected from the a-Si:H film in the c-Si substrate.

2016 ◽  
Vol 9 (6) ◽  
pp. 065801 ◽  
Author(s):  
Rajendra Dahal ◽  
Kawser Ahmed ◽  
Jia Woei Wu ◽  
Adam Weltz ◽  
James Jian-Qiang Lu ◽  
...  

ACS Nano ◽  
2017 ◽  
Vol 11 (3) ◽  
pp. 2706-2713 ◽  
Author(s):  
Dana D. Medina ◽  
Michiel L. Petrus ◽  
Askhat N. Jumabekov ◽  
Johannes T. Margraf ◽  
Simon Weinberger ◽  
...  

2017 ◽  
Vol 9 (51) ◽  
pp. 44799-44810 ◽  
Author(s):  
Ban Xuan Dong ◽  
Joseph Strzalka ◽  
Zhang Jiang ◽  
Huanghe Li ◽  
Gila E. Stein ◽  
...  

2013 ◽  
Vol 205-206 ◽  
pp. 293-298 ◽  
Author(s):  
Martin Kittler ◽  
Manfred Reiche ◽  
Hans Michael Krause

The influence of GBs contained in the channel of MOS-FETs - fabricated in thin SOI layers - is demonstrated. The drain current measured at room temperature increases about 50 times for nFETs and about 10 times for pFETs, respectively, as compared to reference devices. The observations might be interpreted as a strong increase of the mobility of charge carriers. Moreover, the observed stepwise changes of the drain current at 5 K may point to Coulomb blockades.


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