Microstructure Characterization of Hydrogenated Amorphous Silicon Films by Rare Gas Effusion Studies
Keyword(s):
Rare Gas
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ABSTRACTThe effusion of the rare gases neon and helium, as well as of hydrogen, was studied for plasma deposited (boron-doped and undoped) hydrogenated amorphous silicon films, grown at various substrate temperatures. Rare gas atoms were incorporated into the material during the growth process or by ion implantation. The results suggest that helium and neon effusion spectra give information on the material microstructure.
1994 ◽
1981 ◽
1991 ◽
Vol 30
(Part 2, No. 11B)
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pp. L1914-L1916
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1992 ◽
Vol 26
(1-2)
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pp. 137-147
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Keyword(s):
1991 ◽
Vol 79
(8)
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pp. 687-691
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Keyword(s):