scholarly journals Characterization of Thin Carbon Films Produced by the Magnetron Sputtering Technique

2016 ◽  
Vol 19 (3) ◽  
pp. 669-672 ◽  
Author(s):  
Danilo Lopes Costa e Silva ◽  
Luciana Reyes Pires Kassab ◽  
Jose Roberto Martinelli ◽  
Antonio Domingues dos Santos ◽  
Sidney José Lima Ribeiro ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Carbon Films ◽  
Thin Carbon

Characterization of thin carbon films formed on the iron surface by magnetron sputtering with ion-beam mixing

2017 ◽  
Vol 59 (3) ◽  
pp. 613-619 ◽  
Author(s):  
T. S. Kartapova ◽  
O. R. Bakieva ◽  
V. L. Vorob’ev ◽  
A. A. Kolotov ◽  
O. M. Nemtsova ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Ion Beam ◽  
Carbon Films ◽  
Iron Surface ◽  
Ion Beam Mixing ◽  
Thin Carbon

Energetic Deposition and Surface Characterization of Thin Carbon Films on Nickel

1998 ◽  
Vol 12 (10) ◽  
pp. 383-391
Author(s):  
K. P. Adhi ◽  
A. K. Sharma ◽  
S. S. Wagal ◽  
D. S. Joag ◽  
S. K. Kulkarni
Keyword(s):  
Photoelectron Spectroscopy ◽  
Surface Characterization ◽  
Carbon Films ◽  
Polycrystalline Nickel ◽  
Thin Carbon ◽  
Nickel Substrates ◽  
Phase Surface ◽  
Electron Energy Loss ◽  
Deposited Films

Thin films deposited by rapidly quenching the energetic carbon species impinging onto polycrystalline nickel substrates were studied by X-ray photoelectron spectroscopy (XPS), electron energy loss spectroscopy (EELS), and field ion microscopy (FIM). XPS and EELS of the deposited films, when compared with those recorded for graphite and synthetic diamond, indicated the growth of diamond like carbon films and amorphic diamond (a-D) phase. Surface atomic arrangement in the film is observed by FIM which magnifies the surface ~105 to 106 times. Facetting, lack of graphitic ordering, stability of the image inspite of raising or lowering the voltage about the field evaporation voltage indicate that the field ion micrograph is that of a-D.

Analytical characterization of thin carbon films

2003 ◽  
Vol 375 (1) ◽  
pp. 47-52 ◽  
Author(s):  
R. Ohr ◽  
C. Schug ◽  
M. Wahl ◽  
A. Wienss ◽  
H. Hilgers ◽  
...  
Keyword(s):  
Carbon Films ◽  
Analytical Characterization ◽  
Thin Carbon

Production and Characterization of Carbon Thin Films by the Magnetron Sputtering Technique

2016 ◽  
Vol 881 ◽  
pp. 471-474 ◽  
Author(s):  
D.L.C. Silva ◽  
L.R.P Kassab ◽  
J.R. Martinelli ◽  
A.D. Santos ◽  
M.F. Pillis
Keyword(s):  
Thin Films ◽  
Raman Spectroscopy ◽  
Magnetron Sputtering ◽  
Carbon Film ◽  
Carbon Films ◽  
Buffer Layers ◽  
Degree Of Crystallinity ◽  
X Ray Diffraction ◽  
Carbon Thin Films

Carbon thin films were produced by the magnetron sputtering technique. The deposition of the carbon films was performed on Co buffer-layers previously deposited on c-plane (0001) sapphire substrates. The samples were thermally treated under vacuum conditions and characterized by Raman spectroscopy, scanning electron microscopy (SEM) and X-ray diffraction (XRD). The XRD peak related to the carbon film was observed and the Raman spectroscopy indicated a good degree of crystallinity of the carbon film.

Characterization of thin carbon films capable of low-field electron emission

2018 ◽  
Vol 36 (2) ◽  
pp. 02C108 ◽  
Author(s):  
Alexander Andronov ◽  
Ekaterina Budylina ◽  
Pavel Shkitun ◽  
Pavel Gabdullin ◽  
Nikolay Gnuchev ◽  
...  
Keyword(s):  
Electron Emission ◽  
Carbon Films ◽  
Field Electron Emission ◽  
Low Field ◽  
Field Electron ◽  
Thin Carbon

Preparation and structural properties of thin carbon films by very-high-frequency magnetron sputtering

2016 ◽  
Vol 25 (7) ◽  
pp. 075202 ◽  
Author(s):  
Ming-Wei Gao ◽  
Chao Ye ◽  
Xiang-Ying Wang ◽  
Yi-Song He ◽  
Jia-Min Guo ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Structural Properties ◽  
High Frequency ◽  
Carbon Films ◽  
Very High Frequency ◽  
Thin Carbon ◽  
Very High
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