USE OF CATHODIC ARC DEPOSITION FOR IMPARTING SPECIAL PROPERTIES TO THE TEXTILE MATERIAL SURFACE

2015 ◽  
Vol 19 (1) ◽  
pp. 99-103
Author(s):  
Igor P. Smyaglikov ◽  
A. G. Denizhenko ◽  
E. V. Mochaylo ◽  
V. N. Kohnyuk
Keyword(s):  
Textile Material ◽  
Material Surface ◽  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Arc Deposition

Corrosion resistance of TiN/TiAlN-coated ADI by cathodic arc deposition

2006 ◽  
Vol 421 (1-2) ◽  
pp. 182-190 ◽  
Author(s):  
Cheng-Hsun Hsu ◽  
Ming-Li Chen ◽  
Kuei-Laing Lai
Keyword(s):  
Corrosion Resistance ◽  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Arc Deposition

Structural Characteristics of Diamond-Like Carbon Films Synthesized by Different Methods

2017 ◽  
Vol 743 ◽  
pp. 112-117
Author(s):  
Alexander Zolkin ◽  
Anna Semerikova ◽  
Sergey Chepkasov ◽  
Maksim Khomyakov
Keyword(s):  
Amorphous Phase ◽  
Ion Beam ◽  
High Energy ◽  
Carbon Films ◽  
Ion Source ◽  
Ordered Structure ◽  
Deposition Technique ◽  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Arc Deposition

In the present study, the Raman spectra of diamond-like amorphous (a-C) and hydrogenated amorphous (a-C:H) carbon films on silicon obtained using the ion-beam methods and the pulse cathodic arc deposition technique were investigated with the aim of elucidating the relation between the hardness and structure of the films. The hardness of the samples used in the present study was 19 – 45 GPa. Hydrogenated carbon films were synthesized using END–Hall ion sources and a linear anode layer ion source (LIS) on single-crystal silicon substrates. The gas precursors were CH4 and C3H8, and the rate of the gas flow fed into the ion source was 4.4 to 10 sccm. The ion energies ranged from 150 to 600 eV. a-C films were deposited onto Si substrates using the pulse cathodic arc deposition technique. The films obtained by the pulse arc technique contained elements with an ordered structure. In the films synthesized using low- (150 eV) and high-energy (600 eV) ions beams, an amorphous phase was the major phase. The significant blurriness of the diffraction rings in the electron diffraction patterns due to a large film thickness (180 – 250 nm) did not allow distinctly observing the signals from the elements with an ordered structure against the background of an amorphous phase.

Enhancement of discharge and deposition rate by imposed pulse current during the cathodic arc deposition of ta-C films

Vacuum ◽  
2021 ◽  
pp. 110515
Author(s):  
Jian Hu ◽  
Xiubo Tian ◽  
Hongye Liu ◽  
Chunzhi Gong ◽  
Benfu Wang
Keyword(s):  
Deposition Rate ◽  
Pulse Current ◽  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Arc Deposition

Rolling contact fatigue behavior of TiN based coatings deposited on ADI by cathodic arc deposition and plasma based ion implantation and deposition

2019 ◽  
Vol 671 ◽  
pp. 95-102 ◽  
Author(s):  
Juan Pablo Quintana ◽  
Juan Miguel Massone ◽  
Adriana Beatriz Márquez ◽  
Diego Alejandro Colombo
Keyword(s):  
Ion Implantation ◽  
Fatigue Behavior ◽  
Rolling Contact Fatigue ◽  
Contact Fatigue ◽  
Rolling Contact ◽  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Arc Deposition

Cathodic arc deposition of (Al,Cr)2O3: Macroparticles and cathode surface modifications

2011 ◽  
Vol 206 (6) ◽  
pp. 1454-1460 ◽  
Author(s):  
M. Pohler ◽  
R. Franz ◽  
J. Ramm ◽  
P. Polcik ◽  
C. Mitterer
Keyword(s):  
Cathode Surface ◽  
Surface Modifications ◽  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Arc Deposition

Cathodic Arc Deposition

2012 ◽  
pp. 403-403
Author(s):  
Dimitrios Peroulis ◽  
Prashant R. Waghmare ◽  
Sushanta K. Mitra ◽  
Supone Manakasettharn ◽  
J. Ashley Taylor ◽  
...  
Keyword(s):  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Arc Deposition
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