Structural Characteristics of Diamond-Like Carbon Films Synthesized by Different Methods

2017 ◽  
Vol 743 ◽  
pp. 112-117
Author(s):  
Alexander Zolkin ◽  
Anna Semerikova ◽  
Sergey Chepkasov ◽  
Maksim Khomyakov

In the present study, the Raman spectra of diamond-like amorphous (a-C) and hydrogenated amorphous (a-C:H) carbon films on silicon obtained using the ion-beam methods and the pulse cathodic arc deposition technique were investigated with the aim of elucidating the relation between the hardness and structure of the films. The hardness of the samples used in the present study was 19 – 45 GPa. Hydrogenated carbon films were synthesized using END–Hall ion sources and a linear anode layer ion source (LIS) on single-crystal silicon substrates. The gas precursors were CH4 and C3H8, and the rate of the gas flow fed into the ion source was 4.4 to 10 sccm. The ion energies ranged from 150 to 600 eV. a-C films were deposited onto Si substrates using the pulse cathodic arc deposition technique. The films obtained by the pulse arc technique contained elements with an ordered structure. In the films synthesized using low- (150 eV) and high-energy (600 eV) ions beams, an amorphous phase was the major phase. The significant blurriness of the diffraction rings in the electron diffraction patterns due to a large film thickness (180 – 250 nm) did not allow distinctly observing the signals from the elements with an ordered structure against the background of an amorphous phase.

Author(s):  
D. L. Callahan ◽  
S. D. McAdams ◽  
S. Anders ◽  
A. Anders ◽  
I.G. Brown ◽  
...  

Carbon films exhibiting a peak hardness of 59 GPa have been produced using pulsebiased cathodic-arc deposition. This value is much greater than that expected of an amorphous "diamond-like" carbon (die) film and is well within the hardness range of chemically vapor-deposited diamond. Furthermore, this peak hardness is observed at an indentation depth of approximately 50 nm and not on the upper surface of the film. A structural analysis by transmission electron microscopy (TEM) has been conducted in order to explain these mechanical phenomena.Details of the sputtering apparatus are described elsewhere. Films for this study were deposited on silicon using a two-step process in which a thin layer, approximately 10 nm, was first deposited at a relatively high substrate bias (~2 kV) followed by growth of the majority of the film at a lower bias (~200 V). Plan-view examination of carbon films revealed both uniformly amorphous regions and extensive nanocrystalline phase regions.


1997 ◽  
Vol 71 (23) ◽  
pp. 3367-3369 ◽  
Author(s):  
Simone Anders ◽  
Javier Dı́az ◽  
Joel W. Ager ◽  
Roger Yu Lo ◽  
David B. Bogy

2002 ◽  
Vol 11 (7) ◽  
pp. 1436-1440 ◽  
Author(s):  
Ayako Kimura ◽  
Yasushi Azuma ◽  
Tetsuya Suzuki ◽  
Tomohiro Saito ◽  
Yuichi Ikuhara

1995 ◽  
Vol 383 ◽  
Author(s):  
Simone Anders ◽  
André Anders ◽  
Joel W. Ager ◽  
Zhi Wang ◽  
George M. Pharr ◽  
...  

ABSTRACTCathodic arc deposition combined with macroparticle filtering of the plasma is an efficient and versatile method for the deposition of amorphous hard carbon films of high quality. The film properties can be tailored over a broad range by varying the energy of the carbon ions incident upon the substrate and upon the growing film by applying a pulsed bias technique. By varying the bias voltage during the deposition process specific properties of the interface, bulk film and top surface layer can be obtained. We report on nanoindentation and transmission electron microscopy studies as well as stress measurements of cathodic-arc amorphous hard carbon films deposited with varied bias voltage. The investigations were performed on multilayers consisting of alternating hard and soft amorphous carbon.


1997 ◽  
Vol 6 (5-7) ◽  
pp. 626-630 ◽  
Author(s):  
C. Spaeth ◽  
M. Kühn ◽  
U. Kreissig ◽  
F. Richter

1998 ◽  
Vol 120 (4) ◽  
pp. 795-799 ◽  
Author(s):  
C. Singh Bhatia ◽  
S. Anders ◽  
I. G. Brown ◽  
K. Bobb ◽  
R. Hsiao ◽  
...  

Cathodic arc deposition forms ultra-thin amorphous hard carbon films of high sp3 content, high hardness, and low coefficient of friction. These properties make it of great interest for head/disk interface application, in particular for contact recording. In many cases, the tribological properties of the head disk interface could be improved by factors up to ten by applying cathodic arc overcoats to the slider or disk surface. This paper reviews the results of cathodic arc ultra-thin (2–10 nm) carbon overcoats for head/disk interface tribological applications.


1996 ◽  
Vol 68 (6) ◽  
pp. 779-781 ◽  
Author(s):  
George M. Pharr ◽  
Daniel L. Callahan ◽  
Shaun D. McAdams ◽  
Ting Y. Tsui ◽  
Simone Anders ◽  
...  

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