Low-Voltage Electrophoretic Deposition of Nanocrystal-Based Copper-Chalcogenide Thin-Films

2021 ◽  
Author(s):  
Andrew Dillon
Keyword(s):  
Thin Films ◽  
Electrophoretic Deposition ◽  
Low Voltage ◽  
Copper Chalcogenide ◽  
Chalcogenide Thin Films

Prospects toward UV-blue filtered solar drying of agricultural farm produce using chemically deposited copper chalcogenide thin films on cellular polycarbonate

Solar Energy ◽  
2020 ◽  
Vol 203 ◽  
pp. 123-135
Author(s):  
P.K. Nair ◽  
Angélica Lizbeth Espinosa-Santana ◽  
Laura Guerrero-Martínez ◽  
Anabel López-Ortiz ◽  
M.T.S. Nair
Keyword(s):  
Thin Films ◽  
Solar Drying ◽  
Farm Produce ◽  
Copper Chalcogenide ◽  
Chalcogenide Thin Films ◽  
Agricultural Farm

The effect of complexing agents in chemical solution deposition of metal chalcogenide thin films

2021 ◽  
Author(s):  
Sucheta Sengupta ◽  
Rinki Aggarwal ◽  
Yuval Golan
Keyword(s):  
Thin Films ◽  
Chemical Solution Deposition ◽  
Metal Ion ◽  
Chemical Deposition ◽  
Review Article ◽  
Complexing Agents ◽  
Chemical Solution ◽  
Solution Deposition ◽  
Metal Chalcogenide ◽  
Chalcogenide Thin Films

This review article gives an overview of different complexing agents used during chemical deposition of metal chalcogenide thin films and their role in controlling the resultant morphology by effective complexation of the metal ion.

Vibrational and conductive microscopic investigation of thermal dewetting in Ag-As-S chalcogenide thin films

2021 ◽  
pp. 149621
Author(s):  
Correr Wagner ◽  
Messaddeq Sandra Helena ◽  
Douaud Alexandre ◽  
Messaddeq Younes
Keyword(s):  
Thin Films ◽  
Microscopic Investigation ◽  
Chalcogenide Thin Films

An optimized process for fabrication of SrBi2Ta2O9 thin films using a novel chemical solution deposition technique

1999 ◽  
Vol 14 (11) ◽  
pp. 4395-4401 ◽  
Author(s):  
Seung-Hyun Kim ◽  
D. J. Kim ◽  
K. M. Lee ◽  
M. Park ◽  
A. I. Kingon ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Solution Deposition ◽  
Low Voltage ◽  
Ferroelectric Properties ◽  
Chemical Solution ◽  
Solution Deposition ◽  
Chemical Solution Deposition Method ◽  
Low Leakage ◽  
Low Leakage Current ◽  
Voltage Saturation

Ferroelectric SrBi2Ta2O9 (SBT) thin films on Pt/ZrO2/SiO2/Si were successfully prepared by using an alkanolamine-modified chemical solution deposition method. It was observed that alkanolamine provided stability to the SBT solution by retarding the hydrolysis and condensation rates. The crystallinity and the microstructure of the SBT thin films improved with increasing annealing temperature and were strongly correlated with the ferroelectric properties of the SBT thin films. The films annealed at 800 °C exhibited low leakage current density, low voltage saturation, high remanent polarization, and good fatigue characteristics at least up to 1010 switching cycles, indicating favorable behavior for memory applications.

Electrophoretic Deposition of Titania Thin Films: Influence of Deposition Time on Microstructural and Optical Properties of the Coatings

2013 ◽  
Vol 829 ◽  
pp. 917-921
Author(s):  
Saber Ghannadi ◽  
Hossein Abdizadeh ◽  
Mohammad Reza Golobostanfard
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Electrophoretic Deposition ◽  
Deposition Time ◽  
Colloidal Suspension ◽  
Vis Spectroscopy ◽  
Titania Films ◽  
Titania Sol ◽  
Deposited Film ◽  
Deposited Films

Titania thin films were prepared by electrophoretic deposition at various deposition times (1, 5 and 10 min) in constant applied potential (5 V). For this purpose, modified titania sol was prepared as a colloidal suspension. The influence of deposition time on the thickness and optical properties of titania films was investigated. Scanning electron microscope images illustrate compact and homogeneous titania films deposited on FTO substrates. The results show that the film thickness increases with increasing the deposition time. It could be inferred from UV-Vis spectroscopy that increasing the thickness of deposited film causes higher absorbance at UV region. Also, increasing the deposition time from 1 to 5 min leads to increase in optical band gap of the deposited films.

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