Fabrication of Thickness-Controlled Hematite Thin Films via Electrophoretic Deposition and Subsequent Heat Treatment of Pyridine-Capped Maghemite Nanoparticles

Hydroxyapatite/Chitosan (HAp/CS) bio-coatings were prepared on the surface of carbon/ carbon (C/C) composites by hydrothermal electrophoretic deposition, using sonochemical process resulted HAp nanoparticles, isopropyl alcohol and chitosan as raw materials. The influences of hydro- thermal conditions and deposition voltage on the microstructures and morphologies of the as-prepared coatings were investigated. It was shown that homogenous and dense HAp/CS coatings on C/C composites are obtained by hydrothermal electrophoretic deposition. With the increase of deposition voltage, density and homogeneity of the as-prepared HAp/CS composite coatings are well improved. Due to the growth of HAp nanoparticles in the hydrothermal condition, the subsequent heat treatment of the HAp/CS coatings is not needed.

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Growth of polycrystalline hydroxyapatite thin films by pulsed laser deposition and subsequent heat treatment in air

10.1117/12.312755 ◽

1998 ◽

Cited By ~ 2

Author(s):

V. D. Nelea ◽

Cornel Ghica ◽

C. Martin ◽

Alexandru Hening ◽

Ion N. Mihailescu ◽

...

Keyword(s):

Thin Films ◽

Heat Treatment ◽

Pulsed Laser Deposition ◽

Pulsed Laser ◽

Subsequent Heat Treatment ◽

Laser Deposition

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The Precipitation of Si in AlCuSi Thin Films

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100070618 ◽

1973 ◽

Vol 31 ◽

pp. 34-35 ◽

Cited By ~ 1

Author(s):

R. M. Anderson

Keyword(s):

Electron Microscopy ◽

Thin Films ◽

Heat Treatment ◽

Solid Solution ◽

Integrated Circuit ◽

Copper Film ◽

Solution Concentration ◽

X Ray ◽

Silicon Thin Films ◽

Before And After

Aluminum-copper-silicon thin films have been considered as an interconnection metallurgy for integrated circuit applications. Various schemes have been proposed to incorporate small percent-ages of silicon into films that typically contain two to five percent copper. We undertook a study of the total effect of silicon on the aluminum copper film as revealed by transmission electron microscopy, scanning electron microscopy, x-ray diffraction and ion microprobe techniques as a function of the various deposition methods.X-ray investigations noted a change in solid solution concentration as a function of Si content before and after heat-treatment. The amount of solid solution in the Al increased with heat-treatment for films with ≥2% silicon and decreased for films <2% silicon.

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Improving operational properties of thermal sprayed coatings by electropulse treatment on a biphasic high-temperature flow and subsequent heat treatment

Collection of Scientific Publications NUS ◽

10.15589/jnn20140408 ◽

2014 ◽

Vol 0 (4) ◽

Author(s):

Oleksandr M. Dubovyi ◽

Anton А. Karpechenko ◽

Maksym M. Bobrov

Keyword(s):

Heat Treatment ◽

High Temperature ◽

Subsequent Heat Treatment ◽

Sprayed Coatings ◽

Thermal Sprayed Coatings

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Specification for forging of aluminium-zinc-magnesium-manganese-copper alloy (supplied as-forged or annealed for subsequent heat treatment) (not exceeding 150 mm diameter or minor sectional dimension) (Zn 5.7, Mg 2.7, Mn 0.5, Cu 0.5) (7014)

10.3403/00213211u ◽

2015 ◽

Keyword(s):

Heat Treatment ◽

Copper Alloy ◽

Subsequent Heat Treatment ◽

Manganese Copper

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Phase transformation and preferred orientation in carboxylate derived ZrO2 thin films on silicon substates

Journal of Materials Research ◽

10.1557/jmr.1992.3065 ◽

1992 ◽

Vol 7 (11) ◽

pp. 3065-3071 ◽

Cited By ~ 4

Author(s):

Peir-Yung Chu ◽

Isabelle Campion ◽

Relva C. Buchanan

Keyword(s):

Thin Films ◽

Heat Treatment ◽

Phase Transformation ◽

Heating Rate ◽

Tetragonal Phase ◽

Monoclinic Phase ◽

Preferred Orientation ◽

Si Substrate ◽

Interfacial Diffusion ◽

Deposited Films

Phase transformation and preferred orientation in ZrO2 thin films, deposited on Si(111) and Si(100) substrates, and prepared by heat treatment from carboxylate solution precursors were investigated. The deposited films were amorphous below 450 °C, transforming gradually to the tetragonal and monoclinic phases on heating. The monoclinic phase developed from the tetragonal phase displacively, and exhibited a strong (111) preferred orientation at temperature as low as 550 °C. The degree of preferred orientation and the tetragonal-to-monoclinic phase transformation were controlled by heating rate, soak temperature, and time. Interfacial diffusion into the film from the Si substrate was negligible at 700 °C and became significant only at 900 °C, but for films thicker than 0.5 μm, overall preferred orientation exceeded 90%.

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